1. Laser damage of silica and hafnia thin films made with different deposition technologies
- Author
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Cihan Koc, Jean-Yves Natoli, Mireille Commandre, Laurent Gallais, Michel Lequime, Michel Cathelinaud, Jérémie Capoulade, Institut FRESNEL (FRESNEL), Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS), SPIEGregory J. Exarhos, Arthur H. Guenther, Keith L. Lewis, Detlev Ristau, M. J. Soileau, Christopher J. Stolz, Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU), Gallais, Laurent, and SPIEGregory J. Exarhos, Arthur H. Guenther, Keith L. Lewis, Detlev Ristau, M. J. Soileau, Christopher J. Stolz
- Subjects
[PHYS.PHYS.PHYS-OPTICS] Physics [physics]/Physics [physics]/Optics [physics.optics] ,Materials science ,Analytical chemistry ,02 engineering and technology ,01 natural sciences ,law.invention ,Pulsed laser deposition ,010309 optics ,law ,Plating ,0103 physical sciences ,Thin film ,ComputingMilieux_MISCELLANEOUS ,[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] ,biology ,business.industry ,Ion plating ,Sputter deposition ,021001 nanoscience & nanotechnology ,Laser ,Hafnia ,biology.organism_classification ,Optical coating ,Optoelectronics ,0210 nano-technology ,business - Abstract
A comparative study is made on the laser damage resistance of monolayers coatings made with different technologies. HfO 2 and SiO 2 thin films have been deposited on fused silica substrates with Dual Ion Beam Sputtering, Electron Beam Deposition (with and without Ion Assistance) and Reactive Low Voltage Ion Plating technologies. The laser damage thresholds of these coatings have been determined at 1064nm and 355nm using a nanosecond pulsed YAG laser, and a 1-on-1 test procedure.
- Published
- 2007