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Optical waveguide devices are widely used in many fields and have good development prospects. But surface roughness of waveguide device induces a passive effect on the light transmission loss and the Q value of ring cavity, which restricts the development and applications of optical waveguide devices. Currently, the common used surface and side wall smoothing methods for waveguide devices are the thermal oxidation method, laser beam method, and hydrogen annealing method, and the surface hydrogen annealing method has better smoothing effect. However, the mechanism of hydrogen annealing method is still not clear so far, thus the experimental parameters cannot be further optimized to obtain optimal experimental result. Based on the review of the contents mentioned above, the hydrogen annealing mechanism is primarily studied through the simulation analysis by Materials Studio, which provides theoretical foundation and guidance for smoothing of waveguide device by hydrogen annealing technology.