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Your search keyword '"Huang, Chun"' showing total 24 results
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24 results on '"Huang, Chun"'

18. Temperature dependence of the work function of ruthenium-based gate electrodes

Author

Y. Senzaki, G. D. Lian, Husam N. Alshareef, Byoung Hun Lee, Brendan Foran, Huang-Chun Wen, H.R. Harris, Kisik Choi, Prashant Majhi, and H. Luan

Subjects
Materials science, Annealing (metallurgy), Inorganic chemistry, Metals and Alloys, Tantalum, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Atmospheric temperature range, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ruthenium, Hafnium, chemistry, Materials Chemistry, Work function, Silicon oxide, Metal gate
Abstract

The effect of device fabrication temperature on the work function of ruthenium (Ru) metal gate and its bilayers was investigated. The work function shows strong temperature dependence when Ru electrodes are deposited on silicon oxide, SiO 2 , but not on hafnium silicates (HfSiO x ). Specifically, the work function of Ru on SiO 2 increased from 4.5 eV at 500 °C to 5.0 eV at 700 °C. On further annealing to 900 °C or higher, the work function dropped to about 4.4 eV. In the case of HfSiO x , the work function of Ru changed by less than 100 mV over the same temperature range. Identical temperature dependence was observed using hafnium (Hf)/Ru and tantalum (Ta)/Ru bilayers. However, the peak values of the work function decreased with increasing Hf/Ru and Ta/Ru thickness ratios. Materials analysis suggests that these trends are driven by interactions at the Ru metal gate–dielectric interface.

Published
2006

19. Growth mechanism of TiN film on dielectric films and the effects on the work function

Author

Ken Matthews, Husam N. Alshareef, Huang-Chun Wen, R. Harris, P. Y. Hung, Byoung Hun Lee, H. Luan, Craig Huffman, Prashant Majhi, Kisik Choi, Patrick S. Lysaght, Chris M. Sparks, and M. Cruz

Subjects
Metals and Alloys, Nucleation, chemistry.chemical_element, Mineralogy, Surfaces and Interfaces, Dielectric, Microstructure, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, Atomic layer deposition, chemistry, law, Materials Chemistry, Work function, Growth rate, Composite material, Tin
Abstract

We have investigated the growth mechanism of ALD-TiN film on different dielectrics and the resulting effective work function value. TiN nucleation rate and growth rate are found to be dependent on the dielectric films. TiN growth mechanism changed from 3-D type on SiO 2 to layer-by-layer type on HfO 2 . The minimum TiN thickness required for a complete surface coverage varies according to the growth mechanism. Capacitor (MOSCAP) characterization revealed that the effective work function of TiN is dependent not only on dielectric films but also on the TiN thickness. The behavior of work function and fixed charge correlated with the growth mechanism of TiN on dielectric films.

Published
2005

20. Optical properties of Langmuir-Blodgett film of hemicyanine containing the rare earth complex anion Dy(BPMPHD)-2

Author

Wang Ke-Zhi, Xia Xiao-hua, Xu Lingge, Wu Nian-Zu, Zhao Xin-Sheng, Xu Guangxian, Li Tian-Kai, and Huang Chun-Hui

Subjects
Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Infrared spectroscopy, Hyperpolarizability, Surfaces and Interfaces, Langmuir–Blodgett film, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Crystallography, Ultraviolet visible spectroscopy, chemistry, X-ray photoelectron spectroscopy, Monolayer, Materials Chemistry, Dysprosium, Pyridinium
Abstract

( E )- N -hexadecyl-4-(2-(4-dimethylaminophenyl)ethenyl)pyridinium bis(1,6-bis(1′-phenyl-3′-methyl-5′-pyrazolone-4′)hexanedionato- [1,5]) dysprosium (III) was synthesized. The monolayers formed on a pure water subphase (pH 5.6, 18 °C) were transferred onto hydrophilic quartz, calcium fluoride, and glass substrates successively with a transfer ratio of around unity. From second-harmonic generation (SHG) experiments, the second-order molecular hyperpolarizability β was evaluated to be about 4.8 × 10 -48 C m 3 V -2 . The results of UV-visible, IR and X-ray photoelectron spectroscopy of the Langmuir-Blodgett films are also reported.

Published
1994

23. Second-harmonic generation from the monolayers of amphiphilic ferrocene derivatives

Author

Zhao Xin-Sheng, Xie Xiao-Ming, Huang Chun-Hui, Wang Ke-Zhi, Xu Guangxian, Li Tian-Kai, and Xu Lingge

Subjects
Chemistry, Monolayer, Amphiphile, Materials Chemistry, Metals and Alloys, Organic chemistry, Second-harmonic generation, Ferrocene derivatives, Surfaces and Interfaces, Combinatorial chemistry, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Group 2 organometallic chemistry
Published
1994

24. Deposition of hydrophobic nano-coatings with low-pressure radio frequency CH2F2/Ar plasma processing

Author

Huang, Chun, Pan, Chien-Hsuan, and Liu, Chi-Hung

Subjects
*HYDROPHOBIC surfaces, *ARGON plasmas, *METHANE, *SURFACE coatings, *THIN films, *LOW pressure (Science), *RADIO frequency, *NANOTECHNOLOGY
Abstract

Abstract: In an attempt to perform hydrophobic nano-coating, this investigation examined various operational parameters including in RF plasma power, system gas pressure, and CH2F2:Ar ratio of low-pressure plasma processing. The low-pressure plasma, generated with radio frequency power at 13.56MHz, was fed difluoromethane (CH2F2)/Ar gas mixture. The surface characteristics of the plasma polymerized films were studied by static contact angle measurement (CA) and atomic force microscopy (AFM). As a result, increasing deposition of CH2F2 plasma polymerized films was achieved in enhanced RF plasma power input. The CH2F2 plasma polymerized films also were conducted in a varying system gas pressure with enhanced hydrophobic surface property. The effects of CH2F2/Ar plasma on the surface characteristics of the plasma polymerized films were investigated as a function of the Ar content. The super hydrophobic coating under optimized operational parameters prepared in this study obtained water contact angles greater than 150°. It was found that the maximum water contact angles (161°) was obtained at 1.5:1 (CH2F2: Ar) ratio. In addition, AFM analysis shows that possible ion bombardment from CH2F2/Ar plasma can increase surface roughness, and effectively form a hydrophobic coating on the surface of heat sensitive materials. [Copyright &y& Elsevier]

Published
2010
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