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Refractory elements, i.e. elements with very high melting point and low vapor pressure, cannot be released in atomic form from an ISOL target. Therefore most of these elements are presently not available as ISOL beams. However, when reactive gases are introduced into the target, they may form volatile compounds with the refractory elements, allowing for an easier transport to the ion source. Particularly useful are high-temperature stable fluorides and oxides. By these chemical evaporation methods so far ISOL beams of the refractory elements C, Zr, Hf and Ta have been produced. We discuss how ISOL beams of B, Ti, Nb, Mo, Tc, Ru, W, Re, Os and Ir could be produced in a similar way.