1. High-NA metrology and sensing on Berkeley MET5
- Author
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Patrick P. Naulleau, Ryan Miyakawa, and Christopher L. Anderson
- Subjects
Physics ,Wavefront ,business.industry ,Iterative method ,Extreme ultraviolet lithography ,02 engineering and technology ,Wavefront sensor ,021001 nanoscience & nanotechnology ,01 natural sciences ,Metrology ,010309 optics ,Optics ,0103 physical sciences ,Simulated annealing ,Computer vision ,Artificial intelligence ,0210 nano-technology ,Adaptive optics ,Focus (optics) ,business - Abstract
In this paper we compare two non-interferometric wavefront sensors suitable for in-situ high-NA EUV optical testing. The first is the AIS sensor, which has been deployed in both inspection and exposure tools. AIS is a compact, optical test that directly measures a wavefront by probing various parts of the imaging optic pupil and measuring localized wavefront curvature. The second is an image-based technique that uses an iterative algorithm based on simulated annealing to reconstruct a wavefront based on matching aerial images through focus. In this technique, customized illumination is used to probe the pupil at specific points to optimize differences in aberration signatures.
- Published
- 2017
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