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Your search keyword '"Optical measurements -- Methods"' showing total 2 results
Start Over Descriptor "Optical measurements -- Methods" Journal solid state technology
2 results on '"Optical measurements -- Methods"'

1. Wafer-to-wafer control using on-demand pattern metrology

Author

Ausschnitt, Christopher P.

Subjects
Semiconductor industry, Optical measurements -- Methods, Semiconductor industry -- Production processes
Abstract

OVERVIEW Yield in the sub-100nm ground-rule regime strongly depends on controlling the semiconductor patterning process. Three types of measurements govern pattern control: critical dimension (including profile), overlay, and film thickness. […]

Published
2005

2. Technique brings more certainty to mask measurements

Author

Burggraaf, Pieter

Subjects
Semiconductor production equipment, Optical measurements -- Methods, Photolithography -- Methods, Semiconductor production equipment -- Methods
Abstract

Patented flux-area measurement, which enables measurement of features Briefly described, the flux-area technique removes the background around a feature, then sums the total flux of light absorbed or transmitted by […]

Published
1999

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