Search

The conditions for lateral-shear interferogram formation in diffusively scattered fields are analyzed taking into account hologram aberrations for the case of transverse displacement of a mat screen and a negative lens before second photoplate exposure. It is shown that the error of control of wave aberrations of the negative lens results at the hologram reproduction stage when the diffusive field is subject to an off-axis spatial filtering.

Conditions for lateral-shear interferogram formation in coherent diffusively scattered fields are analyzed taking into account hologram aberrations in the case of a transverse displacement of a negative lens and a photoplate before its second exposure. It is shown that the change in the form of the interference pattern characterizing the object under control is caused by a nonlinear dependence of the response of free space between the lens and photoplate on the angular frequency.

Formation of lateral-shear interferograms in fringes of infinite width is analyzed in the third-order approximation for the case of double-exposure recording of a Fourier hologram of a mat screen using a negative lens. Both axial and off-axis hologram aberrations in the objective channel are shown to limit the interferometer sensitivity with increase in the pupil diameter of the lens when controlled over the field.

Conditions for a double-exposure recording of Gabor's holograms to control converging wavefronts using differential interferometry with coherent diffusively-scattered fields for the case of spatial filtering of the diffracton field in the record reproduction stage are examined. The experimental results obtained are in good agreement with theoretical predictions.

Conditions for lateral shear interferogram formation in fringes of infinite width to control converging wavefronts for a double-exposure recording of Fresnel holograms of a mat screen are analyzed for the case of spatial filtering of a diffraction field in the record reproduction stage. The interferometer sensitivity is shown to be limited due to reference wave aberrations during double-exposure hologram recording, when a photoplate is displaced before the second exposure.

It is shown theoretically and by experiment that dual exposure recording of Gabor holograms of an amplitude scattering mask leads to twice the normal sensitivity for the same amount of shift in a lateral shear interferometer of axial wavefront aberrations of a controllable wavefront.

An analysis in the Fresnel approximation is given of the formation conditions of lateral-shear holographic interferograms in bands of infinite width characterizing the wave aberrations of a microscope optical system over the field in the case of coherent diffuse illumination of a ground-glass screen.