1. Effect of plasma treatment on multilayer graphene: X-ray photoelectron spectroscopy, surface morphology investigations and work function measurements
- Author
-
Luis G. B. Machuno, Amit Pawbake, Urmila V. Patil, Rogério Valentim Gelamo, Chandra Sekhar Rout, Sandesh Jadkar, and Dattatray J. Late
- Subjects
Kelvin probe force microscope ,Morphology (linguistics) ,Materials science ,Graphene ,Scanning electron microscope ,General Chemical Engineering ,Analytical chemistry ,Plasma treatment ,02 engineering and technology ,General Chemistry ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,law.invention ,X-ray photoelectron spectroscopy ,law ,Transmission electron microscopy ,Work function ,0210 nano-technology - Abstract
We report here the effect of plasma treatment on multilayer graphene samples as determined by X-ray photoelectron spectroscopy and surface morphology studies with atomic force microscopy, scanning electron microscopy and transmission electron microscopy. The plasma treatment was modified to introduce controlled levels of defects and functionalities to the graphene samples to give tunable properties. The elemental composition and structure were investigated by XPS and micro Raman spectroscopy. The XPS study showed that there was a slight variation in the sp2/sp3 hybridization ratio between the plasma-treated samples and the pristine sample. Kelvin probe measurements were carried out on all the multilayer graphene samples and indicated a slight variation in the work function of the graphene samples after plasma treatment.
- Published
- 2016
- Full Text
- View/download PDF