16 results on '"Steinert, Steffen"'
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2. Direct correlation between mask registration and on-wafer measurements for individual logic device features
3. New registration calibration strategies for MBMW tools by PROVE measurements
4. Dense mask registration fingerprint characterization to better understand and mitigate the metrology to device offset.
5. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay.
6. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance.
7. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution.
8. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
9. Direct correlation between mask registration and on-wafer measurements for individual logic device features.
10. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
11. Registration performance on EUV masks using high-resolution registration metrology
12. Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance
13. On the benefit of high resolution and low aberrations for in-die mask registration metrology
14. The mask contribution as part of the intra-field on-product overlay performance.
15. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance
16. Off-line mask-to-mask registration characterization as enabler for computational overlay
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