24 results on '"Kim, Jin-Min"'
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2. A study of storage life extension for high performance chemically amplified resist coated blanks.
3. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node.
4. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing.
5. The judgment criteria of halftone pinhole defects.
6. The feasibility study of thin Cr film for low process bias.
7. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production.
8. A study of post-exposure baking effect for CAR process in photomask fabrication.
9. Detection capability for chrome defect of tri-tone PSM.
10. Evaluation of EA-PSM opaque repair on 90-nm lithography.
11. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process.
12. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing.
13. Comparative evaluation of mask cleaning performance.
14. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures.
15. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP).
16. Characteristics of residues and optical change of HT PSM during stepwise wet cleaning and optimization of HT PSM cleaning process.
17. Comparative Evaluation of Mask Production CAR Development Process with Stepwise Defect Inspection.
18. 90nm Node CD Uniformity Improvement Using a Controlled Gradient Temperature CAR PEB Process.
19. Preserving EAPSM Phase and Transmission in the Clean Process.
20. Optimum PEC Conditions Under Resist Heating Effect Reduction for 90nm Node Mask Writing.
21. Improved process control of photomask fabrication in e-beam lithography.
22. Evaluation of the practical use of GHOST technique for various e-beam resists.
23. Resolution enhancement with thin Cr for chrome mask making.
24. Correction method for radial effect caused by spin process.
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