1. Radiation-induced mobility of small defect clusters in covalent materials
- Author
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Dane Morgan, Li He, Hao Jiang, Paul M. Voyles, and Izabela Szlufarska
- Subjects
Condensed Matter - Materials Science ,Materials science ,Annealing (metallurgy) ,Materials Science (cond-mat.mtrl-sci) ,FOS: Physical sciences ,02 engineering and technology ,Electron ,021001 nanoscience & nanotechnology ,01 natural sciences ,Instability ,Chemical physics ,Covalent bond ,0103 physical sciences ,Scanning transmission electron microscopy ,Thermal ,Cluster (physics) ,Irradiation ,Atomic physics ,010306 general physics ,0210 nano-technology - Abstract
Although defect clusters are detrimental to electronic and mechanical properties of semiconductor materials, annihilation of such clusters is limited by their lack of thermal mobility due to high migration barriers. Here, we find that small clusters in bulk SiC (a covalent material of importance for both electronic and nuclear applications) can become mobile at room temperature under the influence of electron radiation. So far, direct observation of radiation-induced diffusion of defect clusters in bulk materials has not been demonstrated yet. This finding was made possible by low angle annular dark field (LAADF) scanning transmission electron microscopy (STEM) combined with non-rigid registration technique to remove sample instability, which enables atomic resolution imaging of small migrating defect clusters. We show that the underlying mechanism of this athermal diffusion is ballistic collision between incoming electrons and cluster atoms. Our findings suggest that defect clusters may be mobile under certain irradiation conditions, changing current understanding of cluster annealing process in irradiated covalent materials.
- Published
- 2016
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