1. Single-shot spectrally resolved interferometry for the simultaneous measurement of the thickness and surface profile of multilayer films
- Author
-
Hyug-Gyo Rhee, Young-Sik Ghim, Ki-Nam Joo, and Yong Bum Seo
- Subjects
Materials science ,business.industry ,Imaging spectrometer ,Phase (waves) ,Polarization (waves) ,Atomic and Molecular Physics, and Optics ,law.invention ,Interferometry ,Optics ,Ellipsometry ,Achromatic lens ,law ,Thin film ,business ,Stylus - Abstract
We present a single-shot spectrally-resolved interferometry for simultaneously measuring the film thickness and surface profile of each layer of a patterned multilayer film structure. For this purpose, we implemented an achromatic phase shifting method based on the geometric phase using the polarization characteristics of the light and obtained four phase-shifted interferograms in the spectrally-resolved fringe pattern at the same time by combining a pixelated polarizing camera with an imaging spectrometer. As a result, we could simultaneously measure the reflectance and phase of the sample over a wide wavelength range with a single measurement. To evaluate the validity of the proposed method, we measured a patterned five-layer film specimen and compared our measurement results with those from commercial instruments, an ellipsometer and a stylus profiler, respectively. We confirmed the results matched each other well.
- Published
- 2021