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Although apodization patterns have been adopted for the analysis of sputtering sources, the analytical solutions for the film thickness equations are yet limited to only simple conditions. Empirical formulations for thin film sputtering lacking the flexibility in dealing with multi-substrate conditions, a suitable cost-effective procedure is required to estimate the film thickness distribution. This study reports a cross-discipline simulation program, which is based on discrete particle Monte-Carlo methods and has been successfully applied to a non-imaging design to solve problems associated with sputtering uniformity. Robustness of the present method is first proved by comparing it with a typical analytical solution. Further, this report also investigates the overall all effects cause by the sizes of the deposited substrate, such that the determination of the distance between the target surface and the apodization index can be complete. This verifies the capability of the proposed method for solving the sputtering film thickness problems. The benefit is that an optical thin film engineer can, using the same optical software, design a specific optical component and consider the possible coating qualities with thickness tolerance, during the design stage.

We report an intuitive approach to simulating the performance of the phosphor-based light emitting diode (LED) by using the two-light-sources model for an optimized LED lens. The optimized secondary lens shape is achieved by approaching a uniform energy distribution on the detecting plane. Both the spectrum and spatial apodization of the LED structure are discussed, and the results indicate that the two-light-sources model can solve the misleading design on the phosphor-based LED due to imperfect color mixing of light source, that one can satisfy the highly uniformity requirement for specific applications, such as display backlight or optogenetic.