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We demonstrate fabrication of nano-patterned thin ALD (Atomic layer deposition) membrane (suspended/transferable) by using a bi-layer resist process where the bottom layer resist acts as a sacrificial layer. This method enables an all dry deterministic transfer of nano-patterned ALD membrane on desired substrate, allowing assembly of multitude of hetero-structures \& functionalities that are not yet accessible. Unlike conventional ways of achieving patterned alumina membrane reported in literature our technique requires significantly less fabrication steps and paves the way for novel ALD membrane-based technology.

Neural probes are in vivo brain-invasive devices that record and manipulate neural circuits using electricity, light, or drugs. The capability to shine distinct wavelengths and control their respective output locations for activation or deactivation of specific groups of neurons is desirable but remains unachieved. Here, we discuss our probe’s capability to deliver two independently controllable wavelengths (450 and 655 nm) in the location(s) of interest using nanophotonic directional couplers and ring resonators. These nanophotonics are scalable to dozens of outputs without significantly increasing the device’s lateral dimensions. Furthermore, they are entirely passive and thus do not require electrical input that results in heat generation. Besides, we integrate a high number of electrodes for a simultaneous neural activity readout. Thus, we overcome the challenges associated with multicolor illumination for neural devices by exploiting the capability of miniaturizable, passive probes to deliver two different frequencies in several areas of interest. These devices open the path towards investigating the in vivo electrical signal propagation under the individual or simultaneous activation or inhibition of distinct brain regions.

Aluminum bowtie nanoantennas represent a possibility to confine and enhance electromagnetic (EM) field at optical frequencies in subwavelength regions by using an abundant and inexpensive metal. The native oxidation process of this metal is often viewed as a limitation for its application in plasmonics. Here, we show that in close gap configurations, the high refractive index of the native aluminum oxide helps in squeezing the plasmonic mode in extremely reduced size volumes, providing a higher EM near-field confinement and enhancement in the bowtie antenna gaps than achieved in the pure aluminum counterpart. Hence, the study provides new perspectives in the use of such a plasmonic antenna geometry within this aluminum system, which can be useful for improving plasmonics-enabled effects such as surface-enhanced Raman scattering- and light–matter interaction in strong coupling regime.

The next generation of hard disk drive technology for data storage densities beyond 5 Tb/in2 will require single-bit patterning of features with sub-10 nm dimensions by nanoimprint lithography. To address this challenge master templates are fabricated using pattern multiplication with atomic layer deposition (ALD). Sub-10 nm lithography requires a solid understanding of materials and their interactions. In this work we study two important oxide materials, silicon dioxide and titanium dioxide, as the pattern spacer and look at their interactions with carbon, chromium and silicon dioxide. We found that thermal titanium dioxide ALD allows for the conformal deposition of a spacer layer without damaging the carbon mandrel and eliminates the surface modification due to the reactivity of the metal-organic precursor. Finally, using self-assembled block copolymer lithography and thermal titanium dioxide spacer fabrication, we demonstrate pattern doubling with 7.5 nm half-pitch spacer features.

Nanoimprint lithography (NIL) of functional high-refractive index materials has proved to be a powerful candidate for the inexpensive manufacturing of high-resolution photonic devices. In this paper, we demonstrate the fabrication of printable photonic crystals (PhCs) with high refractive index working in the visible wavelengths. The PhCs are replicated on a titanium dioxide-based high-refractive index hybrid material by reverse NIL with almost zero shrinkage and high-fidelity reproducibility between mold and printed devices. The optical responses of the imprinted PhCs compare very well with those fabricated by conventional nanofabrication methods. This study opens the road for a low-cost manufacturing of PhCs and other nanophotonic devices for applications in visible light.

We report a novel nanofabrication method to fabricate printable integrated circuits with a high refractive index working in the visible wavelength range. The printable planar ligthwave circuits are directly imprinted by ultra-violet nanoimprinting into functional TiO2-based resist on the top of planar waveguide core films. The printed photonic circuits are composed of several elementary components including ridge waveguides, light splitters and digital planar holograms. Multi-mode ridge waveguides with propagation losses around 40 dB cm(-1) at 660 nm wavelength, and, on-chip demultiplexers operated in the visible range with 100 channels and a spectral channel spacing around 0.35 nm are successfully demonstrated.

A novel and robust route for high-throughput, high-performance nanophotonics-based direct imprint of high refractive index and low visible wavelength absorption materials is presented. Sub-10 nm TiO2 nanostructures are fabricated by low-pressure UV-imprinting of an organic–inorganic resist material. Post-imprint thermal annealing allows optical property tuning over a wide range of values. For instance, a refractive index higher than 2.0 and an extinction coefficient close to zero can be achieved in the visible wavelength range. Furthermore, the imprint resist material permits fabrication of crack-free nanopatterned films over large areas and is compatible for fabricating printable photonic structures.

Pattern collapse of small or high aspect ratio lines during traditional wet development is a major challenge for miniaturization in nanolithography. Here we report on a new dry process which combines high resolution resist exposure with selective laser ablation to achieve high resolution with high aspect ratios. Using a low power 532 nm laser, we dry develop a normally negative tone methyl acetoxy calix(6)arene in positive tone to reveal sub-20 nm half-pitch features in a ∼100 nm film at aspect ratios unattainable with conventional development with ablation time of 1–2 s per laser pixel (∼600 nm diameter spot). We also demonstrate superior negative tone wet development by combining electron beam exposure with subsequent laser exposure at a non-ablative threshold that requires far less electron beam exposure doses than traditional wet development.

A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.

A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography.

We have fabricated plasmonic bowtie antennae on the apex of silicon atomic-force microscope cantilever tips that enhance the local silicon Raman scattering intensity by approximately 4 x 10(4) when excited near the antenna resonance. The antennae were fabricated using a novel method, induced-deposition mask lithography (IDML), capable of creating high-purity metallic nanostructures on non-planar, non-conducting substrates with high repeatability. IDML involves electron-beam-induced deposition of a W or SiO(x) hard mask on the material to be pattered, here a 20 nm Au film, followed by Ar ion etching to remove the mask and the unmasked gold, leaving a chemically pure Au bowtie antenna. Antenna function and reproducibility was confirmed by comparing Raman spectra for excitation polarized parallel and perpendicular to the antenna axis, as well as by dark-field spectroscopic characterization of resonant modes. The field enhancement of these plasmonic AFM antennae tips was comparable with antennae produced by electron-beam lithography on flat substrates.