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High-quality patterning determines the properties of patterned emerging two-dimensional (2D) conjugated polymers and is essential for potential applications in future electronic nanodevices. However, the most suitable patterning method for 2D polymers has yet to be determined because we still do not have a comprehensive understanding of their damage mechanisms by visualizing the structural modification that occurs during the patterning process. Here, the damage mechanisms during patterning of 2D polymers, induced by various patterning methods, are unveiled based on a systematic study of structural damage and edge morphology in an imine-based 2D polymer (polyimine). Patterning using a focused electron beam, focused ion beam (FIB) and mechanical carving is evaluated. The focused electron beam successively introduces a sputtering effect, knock-on displacement damage and massive radiolysis with increasing electron dose from 9.46 × 10 7 electrons nm − 2 to 1.14 × 10 10 electrons nm − 2 . Successful patterning is enabled by knock-on damage but impeded by carbon contamination beyond a critical sample thickness. A FIB creates current-dependent edge morphologies and extensive damage from ion implantation caused by the tail of the unfocused beam. A precisely controlled tip can tear the polyimine film through grain boundaries and hence create a patterning edge with suitable edge roughness for certain application scenarios when beam damage is avoided. Taking structural damage and the resulting quantitative edge roughness into consideration, this study provides a detailed instruction on the proper patterning techniques for 2D crystalline polymers and paves the way for tailored intrinsic properties and device fabrication using these novel materials. [ABSTRACT FROM AUTHOR]

Silicene, a monolayer of silicon atoms arranged in a honeycomb lattice, is excellently compatible with the materials used in today's semiconductor manufacturing. In this paper, silicene-terminated CaSi2 is cleaved inside a transmission electron microscope using an in situ manipulator. HRTEM studies on a standard lift-out lamella performed from several crystallographic orientations confirm the cell parameters of a = 3.7 Ĺ and c = 30.60 Ĺ, and allow to determine its exact orientation in the SEM/FIB system. A FIB procedure with corrected tilting and rotating angles has been developed to ensure that the tensile force applied by the manipulator is perpendicular to the (0 0 1) plane, and that the [1 0 0] pole axis could be used for HRTEM imaging. A sharp and flat cleavage interface with a length of more than 1 μm was observed in one in situ experiment. HRTEM images from multiple regions confirm that the flat cleavage follows the (0 0 3) plane of the CaSi2 crystal. The current in situ study demonstrates that a surface sheet with silicene-like atomic arrangement can be mechanically exfoliated from silicide compounds. [ABSTRACT FROM AUTHOR]