1. Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001)
- Author
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Gabriel Vieira Soares, Cláudio Radtke, Lauren A. Galves, J. Marcelo J. Lopes, Gabriela Copetti, Eduardo H. Nunes, Martin Heilmann, and Taís Orestes Feijó
- Subjects
SiC ,Materials science ,Nanofitas ,Band gap ,Bioengineering ,02 engineering and technology ,010402 general chemistry ,Photochemistry ,01 natural sciences ,Strain ,law.invention ,symbols.namesake ,X-ray photoelectron spectroscopy ,law ,XPS ,Microelectronics ,General Materials Science ,Electrical and Electronic Engineering ,Raman ,Graphene ,business.industry ,Mechanical Engineering ,Nanoribbons ,General Chemistry ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,Mechanics of Materials ,Quantum dot ,Grafeno ,Cloração fotoquímica ,symbols ,Chlorine ,0210 nano-technology ,Raman spectroscopy ,business ,Layer (electronics) ,Graphene nanoribbons - Abstract
As different low-dimensional materials are sought to be incorporated into microelectronic devices, graphene integration is dependent on the development of band gap opening strategies. Amidst the different methods currently investigated, application of strain and use of electronic quantum confinement have shown promising results. In the present work, epitaxial graphene nanoribbons (GNR), formed by surface graphitization of SiC (0001) on crystalline step edges, were submitted to photochemical chlorination. The incorporation of Cl into the buffer layer underlying graphene increased the compressive uniaxial strain in the ribbons. Such method is a promising tool for tuning the band gap of GNRs.
- Published
- 2021
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