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Nano-patterning of graphene film by a novel approach making use of laser ablation generated pressure is presented in this paper. Arrays of nanoscale holes were fabricated by applying laser shock pressure on graphene film suspended on well trenches in silicon substrate. Round holes with diameters ranging from 50 to 200 nm on graphene film were successfully punched. The critical pressure was found to be dependent on the diameter of holes. The smaller the diameters, the higher the critical pressure, which was also captured by the molecular dynamic (MD) simulations. The laser shock based approach presented in this paper provides an effective way to pattern graphene film with nanoscale features in an easy, fast, and scalable manner. [ABSTRACT FROM AUTHOR]