1. Remote p-doping of InAs nanowires
- Author
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Marcel A. Verheijen, O. Wunnicke, H-Y Li, Magnus T. Borgström, Wgg Immink, van Mhm Maarten Weert, Epam Erik Bakkers, Photonics and Semiconductor Nanophysics, and Atomic scale processing
- Subjects
Materials science ,Dopant ,business.industry ,Mechanical Engineering ,Doping ,Fermi level ,Nanowire ,Bioengineering ,Nanotechnology ,General Chemistry ,Orders of magnitude (numbers) ,Condensed Matter Physics ,Epitaxy ,symbols.namesake ,Electromagnetic shielding ,symbols ,Optoelectronics ,General Materials Science ,Vapor–liquid–solid method ,business - Abstract
We report on remote p-type doping of InAs nanowires by a p-doped InP shell grown epitaxially on the core nanowire. This approach addresses the challenge of obtaining quantitative control of doping levels in nanowires grown by the vapor-liquid-solid (VLS) mechanism. Remote doping of III-V nanowires is demonstrated here with the InAs/InP system. It is especially challenging to make p-type InAs wires because of Fermi level pinning around 0.1 eV above the conduction band. We demonstrate that shielding with a p-doped InP shell compensates for the built-in potential and donates free holes to the InAs core. Moreover, the off-current in field-effect devices can be reduced up to 6 orders of magnitude. The effect of shielding critically depends on the thickness of the InP capping layer and the dopant concentration in the shell. © 2007 American Chemical Society. U7 - Export Date: 2 August 2010 U7 - Source: Scopus
- Published
- 2007