1. Self-Aligned Multichannel Graphene Nanoribbon Transistor Arrays Fabricated at Wafer Scale
- Author
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Kiyeon Yang, Seongjun Park, Jooho Lee, Heesoon Park, Sanghyun Jo, Chang-Seok Lee, Hyangsook Lee, and Seong-Jun Jeong
- Subjects
Materials science ,Graphene ,business.industry ,Mechanical Engineering ,Transistor ,Transistor array ,Bioengineering ,Nanotechnology ,02 engineering and technology ,General Chemistry ,Chemical vapor deposition ,010402 general chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,0104 chemical sciences ,law.invention ,Nanolithography ,Semiconductor ,law ,General Materials Science ,Field-effect transistor ,Wafer ,0210 nano-technology ,business - Abstract
We present a novel method for fabricating large-area field-effect transistors (FETs) based on densely packed multichannel graphene nanoribbon (GNR) arrays using advanced direct self-assembly (DSA) nanolithography. The design of our strategy focused on the efficient integration of the FET channel and using fab-compatible processes such as thermal annealing and chemical vapor deposition. We achieved linearly stacked DSA nanopattern arrays with sub-10 nm half-pitch critical dimensions (CD) by controlling the thickness of topographic Au confinement patterns. Excellent roughness values (∼10% of CD) were obtained, demonstrating the feasibility of integrating sub-10 nm GNRs into commercial semiconductor processes. Based on this facile process, FETs with such densely packed multichannel GNR arrays were successfully fabricated on 6 in. silicon wafers. With these high-quality GNR arrays, we achieved FETs showing the highest performance reported to date (an on-to-off ratio larger than 10(2)) for similar devices produced using conventional photolithography and block-copolymer lithography.
- Published
- 2016
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