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Electron holography, and high spatial resolution (17Å) computer controlled Parallel Electron Energy Loss Spectrometry (PEELS) were used to probe the structure of and chemical profile across a thin silicon Oxide-Nitride-Oxide (ONO) layered structure of nominal width 10Å-50Å-10Å. We found that the layer widths are on the average 13Å-28Å-18Å, the first oxide layer was discontinuous, and the second oxide layer contained nitrogen. The nitride layer had a silicon to nitrogen concentration ratio of 1.0 ± 0.1. These results show, for the first time, the power of holography in characterizing thin, light element, amorphous layers and the importance of computer controlled parallel energy loss line scans for obtaining analytical information at the highest spatial resolution with minimum dose.

The secondary electron generation process is studied in an ultra-high vacuum scanning transmission electron microscope using electron coincidence spectroscopy. Production pathways for secondary electrons are determined by analyzing coincidences between secondary electrons and individual excitation events. The ultimate spatial resolution available in scanning electron microscopy is limited by the delocalization of the secondary electron generation process. This delocalization is studied using momentum resolved coincidence electron spectroscopy. The fraction of secondary electrons resulting from localized excitations can explain the high spatial resolution observed in secondary electron microscopy images.

Aluminum nitride is known to have a large affinity for oxygen as an impurity. At high levels (>∼4 wt/o) the oxygen is incorporated in the form of planar stacking faults where “pure” 2H AIN is regularly interspersed with a layer of oxygen at the faults. At oxygen levels lower than ∼ 4 wt/o the structure shows an expanded c-axis. The present authors have not observed this effect, rather a random distribution of stacking faults is observed along with another, more prevalent, extended defect identified as an inversion domain boundary (IDB). The IDBs are significantly aplanar (indicating a low interface energy), and often have precipitates and other, faceted defects associated with them. The role of these defects in oxygen accommodation in AIN has been investigated both structurally and chemically by electron optical methods (SEM, TEM, STEM, HREM, CBED, EDS, EELS, and CL-TEM). The structural nature of the boundaries, in the absence of oxygen, requires Al-Al or N-N bonding to occur with some frequency across the boundary. Such bonding is unlikely due to the excess energy required. Chemical analysis (EELS) and luminescence studies (CL-TEM) reveal that oxygen is often associated with the boundaries and may mediate the bonding at the boundary. A model is proposed for the IDB which includes structural aspects combined with considerations of stoichiometry in an effort to understand the origin and energetics of this defect.