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The growth of epitaxial semiconductor nanostructures and films at low temperatures is important for semiconductor technology because it allows the possibility of monolithically integrating different high-performance single-crystalline semiconductor structures directly onto low cost technologically important substrates. At sufficiently low temperatures this can enable, for example, Si or Ge device fabrication on flexible substrates such as plastics. We have studied the reduced-temperature liquid-mediated growth of Ge nanostructures and films on crystalline template layers on non-single-crystalline substrates in a low-pressure chemical vapor deposition (LPCVD) system. The heteroepitaxial process is implemented by the Au seeded vapor-liquidsolid (VLS) catalytic growth technique with germane below 400 ºC. Crystalline template layers were prepared with ion-beam-assisted-deposition (IBAD) texturing and electron-beam evaporation on glass substrates. A thin layer of e-beam evaporated Au forms the catalyst layer, upon which we grew Ge films at 386 ºC. Scanning electron microscopy and x-ray diffraction results indicated that both Ge islands and nanowires grew heteroepitaxially on the crystalline template layers on glass substrates with good alignment over large areas.

We summarize recent progress in growth and characterization of aligned-crystalline silicon (ACSi) films on polycrystalline metal and amorphous glass substrates. The ACSi deposition process uses, as a key technique, ion-beam-assisted deposition (IBAD) texturing on a non-single-crystalline substrate to achieve a biaxially-oriented (i.e., with preferred out-of-plane and in-plane crystallographic orientations) IBAD seed layer, upon which homo- and hetero-epitaxial buffer layers and hetero-epitaxial silicon (i.e., ACSi) films with good electronic properties can be grown. We have demonstrated the versatility of our approach by preparing ACSi films on customized architectures, including fully insulating and transparent IBAD layer and buffer layers based on oxides on glass and flexible metal tape, and conducting and reflective IBAD layer and buffer layers based on nitrides on flexible metal tape. Optimized 0.4-μm-thick ACSi films demonstrate out-of-plane and in-plane mosaic spreads of 0.8° and 1.3°, respectively, and a room-temperature Hall mobility of ∼90 cm2/V.s (∼50% of what is achievable with epitaxial single-crystalline Si films, and ∼1000 times that of amorphous Si films) for a p-type doping concentration of ∼4×1016 cm−3. By using various experimental techniques, we have confirmed the underlying crystalline order and the superior electrical characteristics of low-angle (+–type diode fabricated using a 4.2-μm-thick ACSi film shows minority carrier lifetime of ∼3 μs, an estimated diffusion length of ∼30 μm in the p-Si layer with a doping concentration of 5×1016 cm−3, and external quantum efficiency of ∼80% at 450 nm with the addition of an MgO film anti-reflector.

We report structural and electronic properties of Aligned-Crystalline Si (ACSi) films on glass substrates. These films show enhanced majority carrier mobilities and minority carrier lifetimes with increasing crystallinity, i.e., with improving alignment and connectivity of the grains. A 0.4-μm-thick ACSi film with a total grain mosaic spread of 4.2° showed Hall mobility of 47 cm2/V.s for a p-type doping concentration of 1.9×1018 cm−3. A prototype n+/p/p+–type diode fabricated using a 4.2-μm-thick ACSi film showed minority carrier lifetime of ∼3.5 μs and estimated diffusion length of ∼30 μm in the p layer with a doping concentration of 5×1016 cm−3.

We present an ion-beam based fabrication method for growth of single-crystal-like films that does not utilize epitaxy on single crystal substrates. We use ion-beam assisted texturing to obtain biaxial crystalline alignment in a film. This ion-beam assisted deposition (IBAD) texturing can be done on arbitrary, but smooth substrates, including flexible polycrystalline metal tapes. With IBAD texturing of MgO and subsequent homoepitaxial growth we have demonstrated an in-plane mosaic spread FWHM as low as 2° and out-of-plane alignment of 1°. The deposition system we use includes reel-to-reel tape transport for a linear transport of substrate materials through the deposition zones. This allows for high-throughput experimentation via a linear combinatorial experimental design.

We report the crystal structures and dielectric properties of barium strontium titanate, Ba1−xSrxTiO3 (BST), films deposited on LaAlO3 substrates using pulsed laser deposition, where x = 0.1 to 0.9 at an interval of 0.1. We have found that when x < 0.4 the c-axis is parallel to the plane of the substrate but normal as x approaches 1. Temperature-dependent capacitance measurements at 1 MHz show that the capacitance has a peak and that the peak temperature decreases with increasing x. We have found that the peak temperatures of the films are about 70 °C higher than those of bulk BSTs when x < 0.4. From room-temperature capacitance (C) vs applied voltage (V) measurements, we have found that the C-V curves of the BST films exhibit hysteresis except for x = 0.9 and that the peak voltage at which the capacitance becomes maximum decreases with increasing x. At room temperature, the Ba0.6Sr0.4 TiO3 film exhibits the largest capacitance tunability (≈ 37%) with an applied electric field of 40 kV/cm.

We have used a coplanar waveguide structure to study broadband electrodynamic properties of single-crystal and thin-film strontium titanate (STO), and thin-film barium strontium titanate (BSTO). We have implemented low-frequency capacitance (100 Hz - 1 MHz), swept-frequency transmittance (45 MHz - 4 GHz), and time-domain transmittance (dc - several GHz) measurements to determine effective refractive index (or, dielectric constant), and dissipation factor (or, loss tangent) as a function of dc bias (up to 4×106 V/m) and temperature (20 - 300 K). The STO samples used superconducting electrodes and were designed to operate at cryogenic temperatures, whereas BSTO samples used normal conducting electrodes and exhibited optimal performance around room temperature. By using nearly identical electrode geometries for all devices, we were able to conduct a direct comparative study among them, and investigate not only single-crystal vs thin-film, but also cryogenic vs room-temperature applications.

The low frequency dielectric properties of epitaxial SrTiO3 thin films deposited on LaAlO3 are presented. The films were deposited using radio-frequency magnetron sputtering from stoichiometric targets in an Ar/O2 atmosphere. For the first time, the effects of in situ ozone annealing during the early stages of deposition were explored. X-ray diffraction results indicated that the ozone treatment resulted in more symmetric and sharper diffraction peaks (2 Θ- FWHM decreased from 0.17° to 0.10°). In addition, the peaks for the ozone treated samples were shifted in 2 Θ towards values approaching the bulk value. Rutherford backscattering measurements showed Sr/Ti ratios of 1:1 for these samples, indicating these peak shifts are not due to compositional variations. The dielectric constant of the ozone treated samples increased from 275 at room temperature to 1175 at 22 K (measured at 100 kHz). The effective loss tangent of the device remained between 1 × 10−4 and 1 × 10−3 down to 100 K, where it began to increase. The tunability was also measured. The ozone treated sample showed tunability of 46%, 43% and 38% at 22 K, 40 K and 60 K, respectively. Finally, similar measurements were completed at 1 MHz, indicating a minimal dependence of these properties on frequencies in this range.

We have prepared electrically tunable and active microwave devices incorporating (superconducting YBa2Cu3O7-x)/(nonlinear dielectric SrTiO3) or (normal metal Au)/(nonlinear dielectric Sr0.5Ba0.5TiO3) bilayers. The dielectric layer thickness for these samples varied between 0.5 μm and 2 μm. The top electrode layer for each sample was patterned into a coplanar waveguide device structure. We have configured these devices as voltage-tunable resonators, voltage-tunable phase shifters, voltage-tunable mixers, and voltage-tunable filters. Under dc voltage bias, these prototype devices have exhibited up to 30% resonant frequency modulation, about 1°/mm-GHz phase shift, more than 40 dB change in mixed microwave power, and finetunable symmetric filter profile with less than 2% bandwidth and more than 15% adaptive range.