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Abstract  Polytetrafluoroethylene (PTFE) microstructures’ processing characteristics using X-ray photo dcomposition and desorption are studied in the highest energy region (2 keV to >12 keV). While the exposed surface states are seen melting and boiling from the remaining bubble structure of the irradiated surface, basic photochemistry of PTFE is also same as previous reports and high-aspect ratio structures are successfully formed. We developed new Ni stencil electroformed stencil masks and successfully fabricated first and practical example of PTFE micro fluidic parts. The characteristics of fabricated micro fluidic parts, a PTFE fluid filter for vertical fluid flow operation which works as passive valve, agreed with the calculated results. This suggests that the accuracy of patterning is adequate to apply this technique to fabricate microfluidic parts and other various microparts. [ABSTRACT FROM AUTHOR]

Abstract  The reflectivity of grazing angle X-ray mirrors, used for X-ray deep lithography, is tested by means of a calorimetric method. A deviation in the reflectivity of a used mirror compared with the reflectivity of a clean surface is observed. This deviation is caused by an oxide layer on the mirrors surfaces. The density, thickness and roughness of the assumed oxide layers are determined experimentally. [ABSTRACT FROM AUTHOR]

Abstract  Creatv MicroTech has developed unique fabrication techniques to make high precision, high-aspect-ratio metal microstructures to custom specifications. A lithography based fabrication method permits precise fabrication of various microstructures. Collimators and antiscatter grids with continuous, smooth, thin, parallel or focused septa have been fabricated using deep X-ray and optical lithography, combined with metal electroforming. Microfabrication of high-aspect-ratio structures, especially of relatively large areas, presents many challenges: specialized mask design and X-ray mask fabrication; resist preparation, optimal exposure parameters, post-exposure processing, electroforming, polishing, and final assembly. Here, we present microstructures of various designs that we fabricated and describe the challenges that had to be overcome. [ABSTRACT FROM AUTHOR]

Abstract  Geometrical and dimensional tolerances, obtainable precisions, accuracy, surface quality and roughness need to be controlled in order to realise effective processes and to achieve a real improvement in micromanufacturing technologies. For the fabrication of highly precise mm parts, different processes can be chosen. The LIGA technique, a German acronym consisting of the letters LI (Röntgen Lithographie meaning X-ray lithography), G (Galvanik meaning electroforming) and A (Abformung meaning molding) developed at the Research Center Karlsruhe, offers the possibility to manufacture microstructures with a number of unique features. With these properties, LIGA is on the leading edge of microfabrication. This is a well known issue to most participants in the micro sector. However, most actors consider LIGA to be very expensive, to take much time from design up to realization, and to impose a number of quality problems. In this paper, we try to modify the perception of the LIGA process by addressing some quality properties of the process by taking two different examples and we address the throughput and cost situation by establishing a mass fabrication line for direct LIGA products at ANKA. [ABSTRACT FROM AUTHOR]

Abstract  High focusing efficiency Fresnel zone plates for hard X-ray imaging is fabricated by electron beam lithography, soft X-ray lithography, and gold electroplating techniques. Using the electron beam lithography, Fresnel zone plates which has an outermost zone width of 100 nm and thickness of 250 nm has been fabricated. Fresnel zone plates with outermost zone width of 150 nm and thickness of 660 nm has been fabricated by using soft X-ray lithography. [ABSTRACT FROM AUTHOR]

Abstract  High aspect ratio variable capacitors have been fabricated using deep X-ray lithography and electroplating. Stiction phenomena applicable to high aspect ratio devices are presented, including the conditions for stiction to occur and the critical dimensions of structures. Actuation tests at 3 GHz are also presented and show a maximum capacitance of 0.86 pF with no actuation voltage and a minimum capacitance of 0.70 pF with an actuation voltage of 20 V just before pull-in, which gives a tuning range of 1.23:1. Corresponding Q-factor values are 49.3 and 70.8 respectively. After pull-in, the measured capacitance is 0.61 pF, corresponding to a tuning range of 1.41:1, with a maximum Q-factor of 102.9. [ABSTRACT FROM AUTHOR]

Abstract  A novel type passive mixing device that causes the three-dimensional flow was proposed. This mixer consists of the integrated capillary bundle structure. And the capillaries ware cross-linked each other. So it is called cross-linked micro capillary filter. The mixing effect of the cross-linked micro capillary filter was calculated by the computational fluid dynamics (CFD). The fluid behaviour in the fine three-dimensional structure could be analysed by the use of CFD. In the result of CFD calculation, the cross-linked micro capillary filter estimated high mixing effect. Moreover, the mixing efficiency was become higher by change the cross-linked form. The calculation result was decided the form of the cross-linked micro capillary filter. And this filter was fabricated by application of the Deep X-ray lithography. To form the cross-linked capillary, it was operated twice exposures. In these exposures, respectively the exposure stage was tilted to difference angle. The cross-linked capillary filter fabricated in this way was applied to vertical fluid flow operation. This cross-linked capillary filter could hold and transmit the fluid by the switchover of in impressed pressure. Herewith the cross-linked micro capillary filter showed availability as high efficiency mixing device. [ABSTRACT FROM AUTHOR]

Abstract  Two- or multi-level microstructures are getting more important in several applications such as multi-component micro optical elements and various microfluidic systems. In the present study, a simple and efficient method is newly proposed for a fabrication of the two-level polymeric microstructures. Making a mother two-level microstructure consists of two processes: (1) the hot embossing process for a fabrication of microstructures on a PMMA substrate, and (2) the deep X-ray lithography using the hot embossed substrate for a high aspect ratio microstructure fabrication, resulting in a high aspect ratio microstructure containing smaller microstructures on its surface. Making use of so fabricated two-level microstructures as a mother structure, one could achieve a mass replication of the same microstructures via injection molding process with a metallic mold insert obtained by a nickel electroforming onto the mother microstructure. In order to demonstrate the proposed method, a polymeric high aspect ratio microstructure having smaller square microstructures on its top surface was fabricated. The fabricated two-level microstructure shows fine vertical sidewalls, which is a characteristic feature of the deep X-ray lithography. In addition, a metallic mold insert for a mass replication was fabricated by a nickel electroforming process. [ABSTRACT FROM AUTHOR]

Abstract We have investigated and report in this paper the factors influencing the deformation caused by the dependence between the absorbed X-ray energy on the resist and the shape of the absorber on the X-ray mask. Based on the measurement of errors that occurred during the transferring process between the 2-D shape of mask pattern and the resulting wall of the fabricated 3-D structure, we have developed newly useful graphical data on the absorbed X-ray energy, dosage, and shape of a microstructure. As a result, it is being reported as a method for compensation for the deformed shape after the fabrication of a quadruplets-microneedle. We have considered a number of factors affecting the deformation and finally realized that the effect of a dose?depth nonlinear curve is the most possible cause. Without the compensation of the mask design, we could observe the deformed shapes of the sloped sidewall on the exposed structures. Polymethylmethacrylate microneedle structures fabricated by X-ray lithography with an additional plane-pattern to cross-section transfers technique are directly influenced by the absorber on the X-ray mask pattern. The sidewall of the microneedle was improved by changing the mask pattern from a double right-triangular pattern to a double semi-circular pattern, modeled by comparing the results from a mask-pattern and the actual structure. [ABSTRACT FROM AUTHOR]