1. Design insights into a junctionless nanosheet FET (JL-NSFET) for switching and Analog/RF applications: Device to circuit level assessment.
- Author
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Bheemudu, Vadthya, Vaithiyanathan, Dhandapani, and Kaur, Baljit
- Subjects
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DIGITAL electronics , *ALUMINUM oxide , *NAND gates , *SEMICONDUCTOR technology , *CIRCUIT elements , *ELECTRIC fields - Abstract
- The advent in semiconductor technology paved the way for electronic industry to place in front row. The nanosheet (NS) device is a type gate all around (GAA) architecture provides an excellent gate electrostatic to suppress the short channel effects (SCEs) and scale it further below sub-7nm technology node. This paper provides a complete design insight from device to circuit of a two sheet NSFET with geometrical variations. All digital and analog/RF parameters are extracted and analyzed based on gate length (L G), sheet thickness (T N S ), sheet width (W N S ), and spacer material variations. As L G is varied from 8 nm to 12 nm, I O N / I O F F is enhanced from 0.249 × 108 to 2.86 × 108 due to improved gate control over the channel region which is also reflected in DIBL to 40.82 % whereas, at lower L G analog/RF metrics are better. The T N S play a vital role in device characteristics, as T N S decreases the chance of interaction of electric field from source to drain decreases owing to full volume conduction and thereby ameliorated performance of JL NSFET. As T N S is varied from 7 nm to 5 nm, all electrical characteristics are improved and analog/RF parameters g m , A v , f T , TFP and GTFP are improved to 10.3 %, 18.4 %, 12.1 % 18.5 % and 54.04 %, respectively. Increase in W N S from 10 nm to 20 nm results into increased effective width of a device, it leads to higher I O N current which further impacts on electrical and analog/RF parameters. The DIBL, g m , f T , GFP, TFP and GTFP are enhanced to 63.7 %, 37.9 %, 34.9 %, 9.7 %, 33.5 %, 9.1 %, respectively. The spacer materials are varying from Al 2 O 3 (k = 18), HfO 2 (k = 22), ZrO 2 (k = 25) to TiO 2 (k = 44), the electrical characteristics are better at higher-k whereas analog/RF performances are superior at lower-k. Further, digital circuit elements NOT, NAND and NOR gates are designed, simulated and the delays are examined as 4.25ps, 6.45ps and 5.12ps, respectively. The N M L and N M H of NOT gate are noticed as 295 mV and 280 mV at 0.7 V of supply voltage. Furthermore, a common source (CS) amplifier is also simulated and gain of 3.3 is noticed. The aforementioned analysis revels the JL NSFET is best suitable candidate for future nanoscale applications. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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