10 results on '"Schaekers M"'
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2. High- k dielectrics for future generation memory devices (Invited Paper)
3. Monitoring plasma nitridation of HfSiO x by corona charge measurements
4. Effect of the dielectric thickness and the metal deposition technique on the mobility for HfO2/TaN NMOS devices
5. Impact of material/process interactions on the properties of a porous CVD-O 3 low-k dielectric film
6. Characterisation and integration feasibility of JSR’s low- k dielectric LKD-5109
7. CD control using SiON BARL processing for sub-0.25 μm lithography
8. Monitoring plasma nitridation of HfSiOx by corona charge measurements
9. Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
10. CD control using SiON BARL processing for sub-0.25 @mm lithography
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