42 results on '"Ryssel, H"'
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2. Germanium substrate loss during thermal processing
3. Influence of annealing temperature and measurement ambient on TFTs based on gas phase synthesized ZnO nanoparticles
4. 2D Angular distributions of ion sputtered germanium atoms under grazing incidence
5. Lanthanum implantation for threshold voltage control in metal/high- k devices
6. Impact of interface variations on J– V and C– V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr (1−x)Al xO 2 films
7. Experimental observation of FIB induced lateral damage on silicon samples
8. UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale
9. Gaussian distribution of inhomogeneous barrier height in tungsten/4H-SiC (000-1) Schottky diodes
10. Custom-specific UV nanoimprint templates and life-time of antisticking layers
11. Recent improvements in the integration of field emitters into scanning probe microscopy sensors
12. Hafnium silicate as control oxide in non-volatile memories
13. Accurate parameter extraction for the simulation of direct structuring by ion beams
14. Characterization of interface state densitiesby photocurrent analysis: comparison of results for different insulator layers
15. Three-dimensional simulation of ionized metal plasma vapor deposition
16. Modeling of chemical–mechanical polishing on patterned wafers as part of integrated topography process simulation
17. Electrical characterization and reliability aspects of zirconium silicate films obtained from novel MOCVD precursors
18. Simulation of the influence of via sidewall tapering on step coverage of sputter-deposited barrier layers
19. Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining
20. Three-dimensional simulation of the conformality of copper layers deposited by low-pressure chemical vapor deposition from Cu I(tmvs)(hfac)
21. Reliability of metal-oxide-semiconductor capacitors on 6H-silicon carbide
22. Reliability of ultra-thin gate oxides grown in low-pressure N 2O ambient or on nitrogen-implanted silicon
23. Impact of interface variations on J–V and C–V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1−)Al O2 films
24. Reliability of ultra-thin gate oxides grown in low-pressure N2O ambient or on nitrogen-implanted silicon
25. Fabrication of field emitter array using focused ion and electron beam induced reaction
26. 3D simulation of sputter deposition of titanium layers in contact holes with high aspect ratios
27. Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis
28. 3D simulation for sub-micron metallization
29. Characterization of ultrathin ON stacked layers consisting of thermally grown bottom oxide and deposited silicon nitride
30. Nitrogen implanted etch-stop layers in silicon
31. A comparison of SOI technologies and materials, and prospective fields of application
32. Analysis of microstructured samples by focused ion beam sample preparation
33. Influence of statistical dopant fluctuations on MOS transistors with deep submicron channel lengths
34. A novel end point detection technique for in situ development of photoresist
35. Simulation of high energy implantation profiles in crystalline silicon
36. In situ measurement for resist thickness control and development endpoint detection
37. Novel process control strategies for 300 mm semiconductor production
38. 3D simulation for sub-micron metallization
39. 3D simulation of sputter deposition of titanium layers in contact holes with high aspect ratios
40. Characterization of thin TiSi 2 films by spectroscopic ellipsometry and thermal wave analysis
41. Preface
42. Impact of interface variations on J–V and C–V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1− x )Al x O2 films
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