Author: "Morel, T" / Journal: microelectronic engineering - Searchworks@Jio Institute Digital Library Search Results

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Your search keyword '"Morel, T"' showing total 7 results

Start Over Author "Morel, T" Journal microelectronic engineering

7 results on '"Morel, T"'

1. Formation of NiGe through germanium oxide on Ge(0 0 1) substrate

Author: Nemouchi, F., Carron, V., Lábár, J.L., Vandroux, L., Morand, Y., Morel, T., and Barnes, J.P.
Published: 2013
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2. Alkoxysilane layers compatible with Cu deposition: Towards new diffusion barriers?

Author: Rébiscoul, D., Perrut, V., Morel, T., Jayet, C., Cubitt, R., and Haumesser, P.H.
Published: 2012
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3. Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH 3

Author: Fillot, F., Morel, T., Minoret, S., Matko, I., Maîtrejean, S., Guillaumot, B., Chenevier, B., and Billon, T.
Published: 2005
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4. Copper post-electroplating anneal: evaluation of in-line vs. furnace anneal on layer properties

Author: Haumesser, P.H, Mourier, T, Maı̂trejean, S, Cordeau, M, Morel, T, Avale, X, Pollet, O, and Klocke, J
Published: 2003
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5. Formation of NiGe through germanium oxide on Ge(001) substrate

Author: Nemouchi, F., primary, Carron, V., additional, Lábár, J.L., additional, Vandroux, L., additional, Morand, Y., additional, Morel, T., additional, and Barnes, J.P., additional
Published: 2013
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6. Effect of tungsten chemical vapor deposition nucleation step on via performance

Author: Ulmer, L., primary, Georges, L., additional, Veler, J.C., additional, Morand, Y., additional, Bakli, M., additional, Ferrier, V., additional, Lerme, M., additional, Perroud, L., additional, and Morel, T., additional
Published: 1997
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7. Effect of tungsten chemical vapor deposition nucleation step on via performance

Author: Ulmer, L., Georges, L., Veler, J. C., Morand, Y., Bakli, M., Ferrier, V., Lerme, M., Perroud, L., and Morel, T.
Published: 1996
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