6 results on '"Lux M."'
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2. Removal of post-etch 193 nm photoresist in porous low- k dielectric patterning using UV irradiation and ozonated water
3. Selection of ESH solvents for the wet removal of post-etch photoresists in low- k dielectrics integration
4. Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces
5. An environment friendly wet strip process for 193nm lithography patterning in BEOL applications
6. Removal of post-etch 193nm photoresist in porous low-k dielectric patterning using UV irradiation and ozonated water
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