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Start Over Author "He, Yongyong" Journal microelectronic engineering
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4. Synergetic effect of H2O2 and glycine on cobalt CMP in weakly alkaline slurry.

Author

Jiang, Liang, He, Yongyong, Li, Yan, Li, Yuzhuo, and Luo, Jianbin

Subjects
*HYDROGEN peroxide, *SYNERGETICS, *INTEGRATED circuit design, *GLYCINE, *COBALT compounds, *CRYSTAL etching, *ALKALINE earth metals, *SLURRY
Abstract

Highlights: [•] Cobalt has been regarded as one of the most promising barrier metals for IC manufacturing. [•] The synergetic effect of H2O2 and glycine on the cobalt polishing performance is investigated. [•] The cobalt static etching rate and removal rate (RR) gradually decrease with increasing pH. [•] High concentration of H2O2 in slurry can suppress the cobalt RR. [ABSTRACT FROM AUTHOR]

Published
2014
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