1. Electronic sputtering of thin lithium fluoride films induced by swift heavy ions
- Author
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F. Ropars, Amine Cassimi, R. Martinez, Philippe Boduch, Hermann Rothard, T. Langlinay, Hussein Hijazi, P Salou, E. F. da Silveira, Federal University of Amapà, Centre de recherche sur les Ions, les MAtériaux et la Photonique (CIMAP - UMR 6252), Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Normandie Université (NU)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Pontifical Catholic University of Rio de Janeiro (PUC), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche sur les Matériaux Avancés (IRMA), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), Normandie Université (NU)-Institut national des sciences appliquées Rouen Normandie (INSA Rouen Normandie), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), and Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
Materials science ,Polymers and Plastics ,Astrophysics::High Energy Astrophysical Phenomena ,Ionic bonding ,Stopping power ,01 natural sciences ,Ion ,Biomaterials ,chemistry.chemical_compound ,Sputtering ,0103 physical sciences ,Cluster (physics) ,Irradiation ,010306 general physics ,ComputingMilieux_MISCELLANEOUS ,010302 applied physics ,[PHYS.PHYS.PHYS-ATOM-PH]Physics [physics]/Physics [physics]/Atomic Physics [physics.atom-ph] ,[PHYS.PHYS.PHYS-ATM-PH]Physics [physics]/Physics [physics]/Atomic and Molecular Clusters [physics.atm-clus] ,Metals and Alloys ,Lithium fluoride ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,chemistry ,[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,Particle ,Atomic physics - Abstract
The sputtering of secondary ions from thin lithium fluoride films of different thickness (2 nm ≤ z ≤ 106 nm) irradiated by swift heavy ions (Ni and Ge: ~10 MeV/u) was studied under ultrahigh-vacuum conditions by a time-of-flight imaging technique (XY-TOF-SIMS). Most of the positive ions emitted are (LiF)nLi+ clusters. Cluster structure and stability (magic numbers) are analyzed. A pronounced dependence of sputtered particle yields on the film thickness z was observed. The onset of large cluster emission occurs at a thickness of about z = 20 nm. For thinner films, z = 2 and z = 4 nm, only small clusters (n < 6) are ejected. A threshold for the emission of large clusters was also observed as a function of the electronic stopping power Se at around 6 keV nm−1. This leads to the important conclusion that both a sufficient amount of material (z-dependence) and of deposited energy (Se-dependence) are needed for large ionic cluster emission to occur.
- Published
- 2015
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