1. In-situ Deposition of Graphene Oxide Catalyst for Efficient Photoelectrochemical Hydrogen Evolution Reaction Using Atmospheric Plasma
- Author
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Hyeonuk Choi, Khurshed Alam, Yelyn Sim, Janani Gnanaprakasam, Ji-Hun Yu, Hoonsung Cho, Yujin Chae, and Uk Sim
- Subjects
Materials science ,Hydrogen ,Oxide ,chemistry.chemical_element ,02 engineering and technology ,Chemical vapor deposition ,010402 general chemistry ,01 natural sciences ,Article ,Catalysis ,law.invention ,chemistry.chemical_compound ,Vacuum deposition ,law ,Deposition (phase transition) ,General Materials Science ,hydrophobicity ,Graphene ,Photoelectrochemical cell ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,chemistry ,Chemical engineering ,hydrogen ,photoelectrochemical cell ,graphene oxide ,hydrophilicity ,0210 nano-technology ,atmospheric plasma - Abstract
The vacuum deposition method requires high energy and temperature. Hydrophobic reduced graphene oxide (rGO) can be obtained by plasma-enhanced chemical vapor deposition under atmospheric pressure, which shows the hydrophobic surface property. Further, to compare the effect of hydrophobic and the hydrophilic nature of catalysts in the photoelectrochemical cell (PEC), the prepared rGO was additionally treated with plasma that attaches oxygen functional groups effectively to obtain hydrophilic graphene oxide (GO). The hydrogen evolution reaction (HER) electrocatalytic activity of the hydrophobic rGO and hydrophilic GO deposited on the p-type Si wafer was analyzed. Herein, we have proposed a facile way to directly deposit the surface property engineered GO.
- Published
- 2019