Search

Four AlN nanowire-like structures were simultaneously grown directly without a buffer layer on four substrates-sapphire, quartz, Si(111), and 6H-SiC-via a mixed-source hydride vapor phase epitaxy (HVPE) method using a mixed source (Al+Ga) containing a small quantity of Ga at 1150 °C for 2 h. Deposition was carried out using a simplified reactor designed in series without any separation between the source and the growth zones. AlN nanostructures with hexagonal crystal structures were grown successfully and directly on thin, pre-grown AlN nucleation areas on the quartz substrates. Furthermore, AlN nanostructures were grown on the sapphire substrate without a buffer layer and on pre-grown epilayers on the Si (111) and the 6H-SiC substrates, respectively. The characteristics of the AlN nanowire-like structures grown on the four substrates were investigated using energy-dispersive X-ray spectrometry and field-emission scanning electron microscopy.

AIN epilayers of different thicknesses were grown directly on sapphire substrates without a buffer layer by using a mixed (Al+Ga) source containing 95 at% Al and a mixed-source hydride vapor phase epitaxy (HVPE) method at a temperature of around 1120°C. The grown epilayers consisted of an AlN alloy in the upper region and an AlGaN alloy in the nucleation region just above the sapphire substrate. The upper part of the epilayer gradually transformed from AlGaN into AlN owing to a decrease in the Ga content of the AlGaN alloy grown on the sapphire substrate with increasing growth thickness. The role of Ga in the mixed (Al+Ga) source in the growth of the epilayer directly on the sapphire substrate and the dependence of the growth mechanism of the epilayer with varying Ga contents on the growth thickness were investigated. We found that Ga in the mixed (Al+Ga) source only acted as an activation material that generated gaseous precursors rather than directly contributing to the growth of the epilayers. The mixed-source HVPE method appears suitable for the growth of thick AIN epilayers.

An electrode-evaporation technology on both the top and bottom sides of the bare vertical-type single chip separated from the traditional substrate by cooling, was developed for III-nitride vertical-type single chip LEDs with thick GaN epilayer. The post-process of the cooling step was followed by sorting the bare vertical-type single chip LEDs into the holes in a pocket-type shadow mask for deposition of the electrodes at the top and bottom sides of bare vertical-type single chip LEDs without the traditional substrate for electrode evaporation technology for vertical-type single chip LEDs. The variation in size of the hole between the designed shadow mask and the deposited electrodes owing to the use of the designed pocket-type shadow mask is investigated. Furthermore, the electrical and the optical properties of bare vertical-type single chip LEDs deposited with two different shapes of n-type electrodes using the pocket-type shadow mask are investigated to explore the possibility of the e-beam evaporation method.

An inorganic-organic hybrid junction has been fabricated by spin coating the p-type poly(3- hexylthiophene-2,5-diyl)(P3HT) and poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT: PSS) on an n-type GaN layer. The GaN layer was formed on Al2O3 by metal organic chemical vapor deposition(MOCVD) method. To investigate the effects of P3HT concentration on the electrical properties, we changed P3HT solution concentration and speed of spin coater. The currentvoltage (I-V ) characteristic of Au/PEDOT:PSS/P3HT/n-GaN shows rectifying behavior. The I-V characteristic was examined in the frame work of the thermionic emission model. The most proper rectifying behavior was obtained for 0.6 wt% and thickness below 65 nm of P3HT used diode. We expect that such hybrid structures, suitably developed, might be enable the fabrication of highquality electronic and optoelectronic devices.

We report on crystallographic analyses of one-dimensional GaN nanoneedles grown on a n-GaN epilayer by using hydride vapor phase epitaxy. The nanoneedles were grown with a HCl:NH3 gas flow ratio of 1:38 at 600 °C. The growth time of the GaN nanoneedles affected their morphologies. As time progressed, GaN dots nucleated and then evolved as nanoneedles. The vertical growth rate of GaN nanoneedles was higher than the lateral growth rate under optimized growth conditions. X-ray pole figure measurements were carried out using a four-axis diffractometer. For the sample grown for 20 min, we obtained discrete patterns with six strong dots and weak dough-nut and cotton swab patterns, indicating that most of the nanoneedles were grown ideally, but partially, in the x-y plane with an azimuthal rotation angle ϕ = 15 ~ 45° rotated to the substrate, and a few GaN nanoneedles were tilted by ±4° or by more than 32° from the vertical c-axis.

A carbon microsphere of a core-shell type was grown by using a new method of mixed-source hydride vapor phase epitaxy (HVPE). The surface and the cross section of the carbon microsphere grown by using the new method were observed by using scanning electron microscopy (SEM). The characteristics of the carbon microsphere were investigated by using X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HR-TEM). From these measurements, the diameters of the carbon spheres were about a few hundred micrometers. Furthermore, we showed that carbon microspheres of the core-shell type could be grown successfully by using a mixed-source HVPE method and that they had larger sizes than those grown by using existing methods. This mixed-source HVPE method is proposed as a new method for making carbon microspheres.

A thick AlN epilayer is grown directly on a c-plane sapphire substrate by using the hydride vapor phase epitaxy (HVPE) method with a small quantity of Al. The new type (RF + hot-wall) flow HVPE reactor used in the AlN epilayer growth is custommade. The growth temperatures of the source and the growth zones are set at 950 °C and 1145 °C, respectively. The characteristics of the AlN layer grown on a sapphire substrate are investigated by using energy dispersive spectroscopy (EDS), X-ray diffraction (XRD) and Fourier-transform infrared (FTIR) spectroscopy. The value of the full width at half maximum (FWHM) for the (002) peak from the AlN layer on the sapphire substrate is observed at 790 arcsec. From the small value of the FWHM, the AlN layer seems to be a well-arranged plane with a uniform (002) growth direction on a sapphire substrate.

In this paper, we report structural changes in InGaN micro-structures grown by using mixed-source hydride vapor phase epitaxy (HVPE). Hexagonal nanorods, bunched with many submicron-sized legs and tetrapod-shaped InGaN micro-structures, are grown on r-plane sapphire, c-plane sapphire and Si (111) substrates. As the growth temperature is increased, the overall shape of the InGaN structures changes from clusters of some needle-like legs to bunch shapes of many legs with thicker and hexagonal edges. The grown InGaN structures were analyzed by using X-ray photoelectron spectroscopy (XPS) to characterize the InGaN ternary crystal alloy. The indium mole fractions of the InGaN structures grown at 650 C, 700 C and 750 C were 44 %, 37 % and 27 %, respectively.

GaN/InGaN heterostructure on r-plane Al2O3 substrate is grown by mixed-source hydride vapor phase epitaxy (HVPE). The InGaN/GaN heterostructure is grown by a selective-area growth (SAG) method. The heterostructure consists of an undoped GaN layer, an InGaN layer, and a Mg-GaN layer. NH3 and gallium (or indium) chloride formed with HCl, which is owed over for a mixed source, are used as gallium (or indium) and nitrogen sources. The gas ow rates of HCl and NH3 are maintained at 10 sccm and 500 sccm, respectively. The temperature of the GaN source zone is 650 C. In the case of the InGaN, the temperature of the source zone is 900 C. The growth temperatures of the GaN and InGaN layers are 820 C and 850 C, respectively. The electroluminescence (EL) peak of the GaN/InGaN heterostructure is 468 nm and the full width at half maximum (FWHM) is 89.7 nm. These results demonstrate that the heterostructure of III-nitrides on r-plane sapphire can be successfully grown by mixed-source HVPE.