1. Low Temperature Chemical Vapor Deposition of Aluminosilicate Thin Films on Carbon Fibers
- Author
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Geoffrey L. Williams, Vernal N. Richards, Jason K. Vohs, and Bradley D. Fahlman
- Subjects
Materials science ,Dimethyl methylphosphonate ,Oxide ,Mineralogy ,Chemical vapor deposition ,Substrate (electronics) ,chemistry.chemical_compound ,Carbon film ,chemistry ,Chemical engineering ,Aluminosilicate ,Materials Chemistry ,Ceramics and Composites ,Deposition (phase transition) ,Thin film - Abstract
We report the deposition of aluminum oxide and aluminosilicate thin films onto carbon fiber substrates, at temperatures of 200° and 250°C, respectively. For aluminosilicate films, the Al/Si ratio of the resultant film varied concomitantly with the composition of the liquid precursor mixture. The growth rate for the oxide films was 15–17 A/min, comparable with other methods carried out at higher temperatures. Cross-section SEM images indicate that the deposited films are conformal, following the complex topography of the carbon fiber substrate. Preliminary gas-phase IR analysis suggests that the coatings decompose the nerve agent simulant dimethyl methylphosphonate at temperatures as low as 35°C, suggesting the utility of the reported methodology for the design/fabrication of actively protective fabrics and clothing.
- Published
- 2005
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