1. Identification of vacancy type defects in low and high energy nitrogen ion implanted InP
- Author
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K. Santhakumar, V. Ravichandran, S. Abhaya, V. Sankara Sastry, K.G.M. Nair, G. Amarendra, and G. Venugopal Rao
- Subjects
Diffraction ,Materials science ,Acoustics and Ultrasonics ,Doping ,chemistry.chemical_element ,Condensed Matter Physics ,Crystallographic defect ,Nitrogen ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Ion ,Ion implantation ,chemistry ,Impurity ,Vacancy defect ,Atomic physics - Abstract
Depth resolved positron annihilation measurements were carried out on 85?keV and 1?MeV nitrogen ion implanted InP samples. The defect sensitive S-parameter and R-parameter values for the low energy implantations confirm the presence of monovacancies up to a dose of 1015?cm?2 and coexistence of monovacancies and divacancies for 1016?cm?2 dose sample. Corroborative glancing incidence x-ray diffraction measurements on the highest dose sample revealed that the sample is amorphized. For high energy implantation, it is found that vacancy-defects are present right from the near-surface region and these defects are identified to be monovancancies, based on the observed S- and R-parameters. A comparison of the results for the low and high energy implantations is made.
- Published
- 2005
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