It is our pleasure to introduce this special issue appearing on the occasion of the 25th anniversary of pulsed laser deposition (PLD), which is today one of the most versatile growth techniques for oxide thin films and nanostructures. Ever since its invention, PLD has revolutionized the research on advanced functional oxides due to its ability to yield high-quality thin films, multilayers and heterostructures of a variety of multi-element material systems with rather simple technical means. We appreciate that the use of lasers to deposit films via ablation (now termed PLD) has been known since the 1960s after the invention of the first ruby laser. However, in the first two decades, PLD was something of a 'sleeping beauty' with only a few publications per year, as shown below. This state of hibernation ended abruptly with the advent of high T c superconductor research when scientists needed to grow high-quality thin films of multi-component high T c oxide systems. When most of the conventional growth techniques failed, the invention of PLD by T (Venky) Venkatesan clearly demonstrated that the newly discovered high-T c superconductor, YBa2Cu3O7−δ , could be stoichiometrically deposited as a high-quality nm-thin film with PLD [1]. As a remarkable highlight of this special issue, Venkatesan gives us his very personal reminiscence on these particularly innovative years of PLD beginning in 1986 [2]. After Venky's first paper [1], the importance of this invention was realized worldwide and the number of publications on PLD increased exponentially, as shown in figure 1. Figure 1. Published items per year with title or topic PLD. Data from Thomson Reuters Web of Knowledge in September 2013. After publication of Venky's famous paper in 1987 [1], the story of PLD's success began with a sudden jump in the number of publications, about 25 years ago. A first PLD textbook covering its basic understanding was soon published, in 1994, by Chrisey and Hubler [3]. Within a decade, large-area PLD grown YBa2Cu3O7−δ thin films became a reality for applications in microwave filters for satellite and mobile communication. The material systems that could be covered under the PLD gamut extended to almost all oxides, nitrides and even organics. A second textbook exclusively dedicated to PLD was edited by Rob Eason in 2007 [4], reviewing many possible modifications and extensions of the method. To celebrate 25 years of pulsed laser deposition, Venkatesan organized a symposium on 'Recent Advances in the Pulsed Laser Deposition of Thin Films and Nanostructures' in 2013 [5]. Besides dielectric, ferroelectric and magnetic oxides, the wide-bandgap group II–VI semiconductor ZnO is among the most intensively researched compounds during the last decade. Therefore, this material has become the subject of two introductory reviews in this issue by Opel et al and Tsukazaki et al , to show the state-of-the-art work carried out on ZnO thin films to 2013. The detailed insights into growth parameter control and their impact on the ZnO film performance make both reviews highly instructional not only for specialists, but also for beginners in PLD. The perspective of PLD towards industrial applications largely depends, first, on the ability of the excimer laser suppliers to further increase the laser power and, second, on the deposition schemes to distribute the ablated material homogeneously on technologically relevant substrate areas (8-inch diameter). These developments are explained here by the leading companies dealing with high-power excimer lasers and large-area PLD equipment, such as Coherent Laser Systems GmbH, PVD Products, Inc., and SolMateS B.V. It is also important to note the efforts made by Blank and Rijnders for atomic layer control of PLD by in situ high-pressure reflection high-energy electron diffraction (RHEED), which is now adopted by many groups worldwide. The potential of multi-beam PLD for advanced optical waveguides and of advanced design-of-experiment schemes to shorten the optimization effort for new materials is presented at the end of this methodical section. Further, the issue contains original papers on other prominent PLD activities, such as dielectric SrTiO3 films, magnetic and spintronic La1−x Srx MnO3, and multiferroic BiFeO3. The role of cationic and anionic point defects and their control during PLD is discussed based on the examples of the simple perovskite SrMoO3 and the double perovskite Sr2CrWO6. The final paper in this thin-film-related section provides a good account of in situ high-temperature surface smoothing of Ba2TiSi2O8 fresnoite films and growth from glassy fresnoite targets with 100% theoretical density. The flexibility of the PLD technique has resulted in several schemes to grow nanostructures, which is unique in the nature of PLD. Okada's group succeeded in controlling the growth density of ZnO nanowires by varying the thickness of the ZnO buffer layer, and nanowalls could be patterned by interference phenomenon using laser irradiation. PLD-based methods are further used to grow metal nanoparticle plasmonic films with packing densities up to 1011 particles cm−2, and ZnO nanowires from screw dislocation driven two-dimensional hexagonal stacking on diamond substrates. Overall, this special issue provides an up-to-date overview on the current status, potential and the extraordinary success and development of PLD from a simple laboratory growth method to a viable industrial technique for fabrication of advanced oxide thin films. We thank all the authors and reviewers for their contributions to this special issue. We would like to place on record our gratitude for the timely help extended by the editorial team, Dr Olivia Roche, Dean Williams and Colin Adcock. References [1] Dijkkamp D, Venkatesan T, Wu X D, Shaheen S A, Jisrawi N, Min-Lee Y-H, McLean W L and Croft M 1987 Preparation of YBaCu oxide superconductor thin films using pulsed laser evaporation from high T c bulk material Appl. Phys. Lett. 51 619 [2] Venkatesan T 2014 Pulsed laser deposition—invention or discovery? J. Phys. D: Appl. Phys. 46 034001 [3] D B Chrisey, G H Hubler, 1994 Pulsed Laser Deposition of Thin Films (New York: Wiley) [4] R Eason, 2007 Pulsed Laser Deposition of Thin Films—Applications-Led Growth of Functional Materials (Hoboken, NJ: Wiley-Interscience) [5] MRS Singapore ICMAT Symposia Proceedings, Procedia Engineering (2013) Symposium IRecent Advances in the Pulsed Laser Deposition of Thin Films and Nanostructures at press