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International audience; This paper discusses the results of high temperature resistivity and Hall effect studies of Mg-doped GaN and AlxGa1−xN epilayers (0.05

GaN epilayers and GaN/AlGaN quantum wells (QWs) were grown by molecular beam epitaxy on GaN(0001) single crystal substrates. Transmission electron microscopy (TEM) was used to assess the crystal quality of the homoepitaxial layers. A dislocation density of less than 10(5) cm(-2) is deduced from TEM imaging. Low temperature (1.8 K) photoluminescence (PL) of homoepitaxial GaN reveals PL linewidths as low as 0.3 meV for bound excitons. The PL integrated intensity variation between 10 and 300 K is compared to that observed on a typical heteroepitaxial GaN/Al2O3 layer. A 2 nm thick GaN/Al0.1Ga0.9N QW has been studied by time-resolved and continuous wave PL. The decay time is close to a purely radiative decay, as expected for a low defect density. Finally, the built-in polarization field measured in a homoepitaxial QW is shown to be comparable to that measured on heteroepitaxial QWs grown either on sapphire or silicon substrates. (C) 2000 American Institute of Physics. [S0021-8979(00)07513- 7].

High-pressure and time-resolved studies of the optical emission from n-type doped GaN/AlN multi-quantum-wells (MQWs) with various well thicknesses are analysed in comparison with ab initio calculations of the electronic (band structure, density of states) and optical (emission energies and their pressure derivatives, oscillator strength) properties. The optical properties of GaN/AlN MQWs are strongly affected by quantum confinement and polarization-induced electric fields. Thus, the photoluminescence (PL) peak energy decreases by over 1 eV with quantum well (QW) thicknesses increasing from 1 to 6 nm. Furthermore, the respective PL decay times increased from about 1 ns up to 10 μs, due to the strong built-in electric field. It was also shown that the band gap pressure coefficients are significantly reduced in MQWs as compared to bulk AlN and GaN crystals. Such coefficients are strongly dependent on the geometric factors such as the thickness of the wells and barriers. The transition energies, their oscilla...

International audience; We investigated the relation between structural properties and carrier recombination processes in InGaN∕GaNmultiple quantum well(MQW) structures with quantum well widths of 3 and 9nm, grown by metal-organic chemical-vapor deposition on bulk GaN crystals. Quantum barriers of the samples are heavily n-type doped in order to effectively screen the large polarization-induced electric fields which commonly occur in hexagonal InGaN∕GaN quantum structures. High thermal stability in these structures, reflected by strong photoluminescence(PL) even above 400K, is attributed to a combination of low-dislocation densities and potential profile fluctuations in the InGaN∕GaNquantum wells. The role of potential profile fluctuations is further investigated by time-resolved photoluminescence and cathodoluminescence(CL) mapping. Comparison of both samples shows that the sample with 3‐nm-wide QWs exhibits (i) a larger width of the PL peak in the temperature range of 8–420K, (ii) a higher amplitude of potential profile fluctuations as measured by CL mapping, and (iii) higher radiative and nonradiative PL recombination times. At the same time a much weaker drop of PL intensity with temperature is recorded on the sample with 9‐nm-wide QWs. Our results show that, contrary to intuitive expectation, a decrease of the potential profile fluctuation amplitude can be helpful in enhancing the radiative recombination efficiency, particularly at high temperatures.