1. Interfacial reactions between WN(sub x) and poly Si(sub 1-x)Ge(sub x) films
- Author
-
Sung Kwan Kang, Byoung Gi Min, Jae Jin Kim, Dae-Hong Ko, Han Byul Kang, Cheol Woong Yang, and Mann-Ho Cho
- Subjects
Dielectric films -- Electric properties ,Thin films -- Electric properties ,Tungsten -- Atomic properties ,Germanium -- Atomic properties ,Silicon -- Atomic properties ,Physics - Abstract
The interfacial reactions at the Wn(sub x)/poly Si interface and at the Wn(sub x)/poly Si0.4Ge0.6 interface with the annealing conditions are investigated using high resolution transmission electron microscope (HR-TEM) and x-ray photoelectron spectroscopy (XPS). It is observed that the Si in poly Si0.4Ge0.6 reacts preferentially with N, produced in the decomposition of WN(sub x) films, due to lower Gibbs free energy of the Si compound than the Ge compound and unreacted Ge atoms accumulate at the WN(sub x)/poly Si(sub 1-x)Ge(sub x) interface
- Published
- 2003