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The influence of photoelectron emission from the mirror on the sheath dynamics and on the ion impact energy is studied. The ion impact energy distribution is convoluted with the formula of Yamamura and Tawara for the sputter yield to obtain the rate of physical sputtering.

The ion emission of a Sn-based discharge produced extreme ultraviolet producing plasma is characterized with the combined use of different time-of-flight techniques. An electrostatic ion spectrometer is employed to measure the average charge distribution of the emitted Sn ions. A dedicated Faraday cup configuration is used to measure the total ion flux from the source for different discharge energies. High-energy Sn ions emitted by the plasma with energies up to 100 keV have been identified. The number of high-energy ions increases for higher electrical input energy into the plasma while the signal associated with the expanding plasma ions does not show such dependence. The ion energy distribution for a bulk of detected ions is calculated based on the Faraday cup measurements and compared with theoretical plasma expansion dynamics. [ABSTRACT FROM AUTHOR]

The origin and nature of the high-energy ions emitted by a discharge produced plasma source are studied using gated pinhole camera imaging. Time-of-flight analysis in combination with Faraday cup measurements enables characterization of the high-velocity component of the ionic debris. The use of an optional magnetic field allows mass-to-charge analysis of the first part of the Faraday cup signal. It is shown that this consists mainly of oxygen ions emitted from a region near the cathode. Time-resolved images of Sn ions with a kinetic energy of 45 keV visualize the regions in between the electrodes where the high-energy ion generation takes place. [ABSTRACT FROM AUTHOR]