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Metal-catalyst-free chemical vapor deposition (CVD) of large area uniform nanocrystalline graphene on oxidized silicon substrates is demonstrated. The material grows slowly, allowing for thickness control down to monolayer graphene. The as-grown thin films are continuous with no observable pinholes, and are smooth and uniform across whole wafers, as inspected by optical-, scanning electron-, and atomic force microscopy. The sp 2 hybridized carbon structure is confirmed by Raman spectroscopy. Room temperature electrical measurements show ohmic behavior (sheet resistance similar to exfoliated graphene) and up to 13 of electric-field effect. The Hall mobility is ∼40 cm 2/Vs, which is an order of magnitude higher than previously reported values for nanocrystalline graphene. Transmission electron microscopy, Raman spectroscopy, and transport measurements indicate a graphene crystalline domain size ∼10 nm. The absence of transfer to another substrate allows avoidance of wrinkles, holes, and etching residues which are usually detrimental to device performance. This work provides a broader perspective of graphene CVD and shows a viable route toward applications involving transparent electrodes.

This paper investigates energy filtering in silicon nanowires and nanosheets by resonant electron tunneling through a geometric superlattice. A geometric superlattice is any kind of periodic geometric feature along the transport direction of the nanowire or nanosheet. Multivalley quantum-transport simulations are used to demonstrate the manifestation of minibands and minibandgaps in the transmission spectra of such a superlattice. We find that the presence of different valleys in the conduction band of silicon favors a nanowire with a rectangular cross section for effective energy filtering. The obtained energy filter can consequently be used in the source extension of a field-effect transistor to prevent high-energy electrons from contributing to the leakage current. Self-consistent Schrodinger-Poisson simulations in the ballistic limit show minimum subthreshold swings of 6 mV/decade for geometric superlattices with indentations. The obtained theoretical performance metrics for the simulated devices are compared with conventional III-V superlatticeFETs and TunnelFETs. The adaptation of the quantum transmitting boundary method to the finite-element simulation of 3-D structures with anisotropic effective mass is presented in Appendixes A and B. Our results bare relevance in the search for steep-slope transistor alternatives which are compatible with the silicon industry and can overcome the power-consumption bottleneck inherent to standard CMOS technologies.This paper investigates energy filtering in silicon nanowires and nanosheets by resonant electron tunneling through a geometric superlattice. A geometric superlattice is any kind of periodic geometric feature along the transport direction of the nanowire or nanosheet. Multivalley quantum-transport simulations are used to demonstrate the manifestation of minibands and minibandgaps in the transmission spectra of such a superlattice. We find that the presence of different valleys in the conduction band of silicon favors a nanowire with a rectangular cross section for effective energy filtering. The obtained energy filter can consequently be used in the source extension of a field-effect transistor to prevent high-energy electrons from contributing to the leakage current. Self-consistent Schrodinger-Poisson simulations in the ballistic limit show minimum subthreshold swings of 6 mV/decade for geometric superlattices with indentations. The obtained theoretical performance metrics for the simulated devices are ...

Luminescence imaging is currently being used to provide spatially resolved defect in high volume silicon solar cell production. One option to obtain the high throughput required for on the fly detection is the use a silicon line scan cameras. However, when using a silicon based camera, the spatial resolution is reduced as a result of the weakly absorbed light scattering within the camera's chip. This paper address this issue by applying deconvolution from a measured point spread function. This paper extends the methods for determining the point spread function of a silicon area camera to a line scan camera with charge transfer. The improvement in resolution is quantified in the Fourier domain and in spatial domain on an image of a multicrystalline silicon brick. It is found that light spreading beyond the active sensor area is significant in line scan sensors, but can be corrected for through normalization of the point spread function. The application of this method improves the raw data, allowing effecti...

Silicon nanocrystals embedded in silicon oxide that show room temperature photoluminescence (PL) have great potential in silicon light emission applications. Nanocrystalline silicon particle formation by laser irradiation has the unique advantage of spatially controlled heating, which is compatible with modern silicon micro-fabrication technology. In this paper, we employ continuous wave laser irradiation to decompose substrate-bound silicon-rich silicon oxide films into crystalline silicon particles and silicon dioxide. The resulting microstructure is studied using transmission electron microscopy techniques with considerable emphasis on the formation and properties of laser damaged regions which typically quench room temperature PL from the nanoparticles. It is shown that such regions consist of an amorphous matrix with a composition similar to silicon dioxide which contains some nanometric silicon particles in addition to pores. A mechanism referred to as “selective silicon ablation” is proposed which consistently explains the experimental observations. Implications for the damage-free laser decomposition of silicon-rich silicon oxides and also for controlled production of porous silicon dioxide films are discussed.Silicon nanocrystals embedded in silicon oxide that show room temperature photoluminescence (PL) have great potential in silicon light emission applications. Nanocrystalline silicon particle formation by laser irradiation has the unique advantage of spatially controlled heating, which is compatible with modern silicon micro-fabrication technology. In this paper, we employ continuous wave laser irradiation to decompose substrate-bound silicon-rich silicon oxide films into crystalline silicon particles and silicon dioxide. The resulting microstructure is studied using transmission electron microscopy techniques with considerable emphasis on the formation and properties of laser damaged regions which typically quench room temperature PL from the nanoparticles. It is shown that such regions consist of an amorphous matrix with a composition similar to silicon dioxide which contains some nanometric silicon particles in addition to pores. A mechanism referred to as “selective silicon ablation” is proposed which ...

In this paper, we proposed a novel nano-gap thermophotovoltaic (TPV) device made up of thin-films including the radiator. The optical, electrical, and thermal responses and performance of the device were assessed using coupled opto-electro-thermal numerical simulation. The device design consists of a thin-film tungsten radiator which is paired with a thin-film silicon TPV cell across a nanometric vacuum gap. Results were simulated based on experimental properties available in the current literature database. It is discovered that the maximum electrical power output of the thin-film nano-gap TPV device increases with cell temperature up to a certain threshold value due to improvements in generated photocurrent. Thin-film tungsten as a radiator is shown to improve radiative heat transfer above the bandgap compared to conventional bulk tungsten. The effect of cell thickness on responses and performance was also analysed. A 1-μm cell produces better performance over thinner thicknesses at the cost of greater cooling requirements. However, the improvements in output power offset the cooling costs, allowing for consistently favourable efficiencies. Finally, it is shown that the temperature profile in silicon thin-films under convective cooling can be approximated as uniform, simplifying the heat transport modelling process.In this paper, we proposed a novel nano-gap thermophotovoltaic (TPV) device made up of thin-films including the radiator. The optical, electrical, and thermal responses and performance of the device were assessed using coupled opto-electro-thermal numerical simulation. The device design consists of a thin-film tungsten radiator which is paired with a thin-film silicon TPV cell across a nanometric vacuum gap. Results were simulated based on experimental properties available in the current literature database. It is discovered that the maximum electrical power output of the thin-film nano-gap TPV device increases with cell temperature up to a certain threshold value due to improvements in generated photocurrent. Thin-film tungsten as a radiator is shown to improve radiative heat transfer above the bandgap compared to conventional bulk tungsten. The effect of cell thickness on responses and performance was also analysed. A 1-μm cell produces better performance over thinner thicknesses at the cost of greater ...

Ferroelectric hafnium oxide is a promising candidate for logic and memory applications as it maintains excellent ferroelectric properties at nm-size ensuring compatibility with state of the art semiconductor manufacturing. Most of the published papers report on the study of this material through Metal-Insulator-Metal capacitors or Metal-Insulator-Silicon transistors. However, for 3D vertical transistors in which both the channel and gate are polysilicon, the case of silicon-based electrodes cannot be ignored. In this paper, we report the fabrication of various ferroelectric capacitors with silicon (S) based conductive layers and titanium nitride metal (M) electrodes using aluminum doped hafnium oxide (I). The ferroelectric device with silicon-based electrodes shows superior polarization and steeper switching. These results pave the way toward 3D integration for potential 3D NAND replacement.

The gated polysilicon field emitter arrays coated with diamondlike carbon (DLC) were fabricated by a transfer mold method using anisotropic etching of Si and the deposition of DLC using methane ion beam. This paper describes significant enhancement in electron emission and considerable reduction in turn-on voltage for the emitter arrays by the DLC coating. In addition, the paper discusses the emission mechanism from the energy band diagram of a field emitter coated with a sufficiently thin dielectric material having a low electron affinity, and shows that an effective work function of the DLC coated polysilicon field emitter is about 2.9 eV.

Molecular electronics studies how the molecular nature affects the probability of charge carriers to tunnel through the molecules. Nevertheless, transport is also critically affected by the contacts to the molecules, an aspect that is often overlooked. Specifically, the limited ability of non-metallic contacts to maintain the required charge balance across the fairly insulating molecule often have dramatic effects. This paper shows that in the case of lead/organic monolayer-silicon junctions, a charge balance is responsible for an unusual current scaling, with the junction diameter (perimeter), rather than its area. This is attributed to the balance between the 2D charging at the metal/insulator interface and the 3D charging of the semiconductor space-charge region. A derivative method is developed to quantify transport across tunneling metal-insulator-semiconductor junctions; this enables separating the tunneling barrier from the space-charge barrier for a given current-voltage curve, without complementary measurements. The paper provides practical tools to analyze specific molecular junctions compatible with existing silicon technology, and demonstrates the importance of contacts' physics in modeling charge transport across molecular junctions.

This paper provides a detailed description explaining how to calculate the relation between the silicon Raman frequency and local stress or strain in the silicon, applied to stress measurements in microelectronics. This relation is well known for measurements from the (100) surface of silicon. However, it is often used in the wrong way, neglecting non-zero stress tensor elements. Especially, in current 3D microelectronics technology, where the stress caused by through Si vias or micro-bumps is of large importance, the vertical stress component, which highly affects the measured Raman frequency shift, is often erroneously neglected. In addition, the equations for the (100) surface are also often used incorrectly for cross-sectional measurements from a (110) surface. In this paper, different ways to calculate the relation between Raman frequency and triaxial stress, and the related Raman peak intensities, are discussed in detail.

When measuring I-V characteristics and carrier lifetimes in quasi-steady-state (QSS) conditions, it is important to consider the time dependence of the charge due to excess carriers within the device. This paper shows that the space-charge region present in pn-junction devices and in many lifetime test structures can produce a significant capacitive effect when measuring the low voltage and low carrier density range of QSS I-V curves. Both computer modeling and experiments show that the junction capacitance is particularly significant in the case of low-resistivity silicon wafers, but it can also be noticeable in intermediate and high-resistivity samples. The paper demonstrates that the static I-V characteristics can be accurately reconstructed using a simple analytical model for the space-charge region. It thus fills a gap in the understanding of the low injection range of QSS voltage and lifetime measurements.

Structure-engineered silicon exhibits a wealth of unique optical properties below its bandgap, which holds promise for mid-infrared and terahertz applications such as photodetection, thermophotovoltaics, radiative cooling, and spectroscopy. In this paper, we investigate enhancement mechanisms of sub-bandgap absorption of black silicon fabricated into periodic pyramids. Our measurements indicate that the pyramid structure leads to an enhanced broadband absorption in the wavelength region from 1.5 to 13.07 μm with an efficiency of over 80%. The broadband absorption enhancement is shown to originate from the Rayleigh–Wood anomaly, localized magnetic plasmonic resonance, and graded-index effect, which together facilitate the interaction between light and free-carriers in silicon. These results are helpful for understanding the interaction between light and black silicon.

Applying atmospheric plasma etching to the surface texturing process of silicon solar cells is a promising strategy for the current photovoltaic manufacturing industry due to its low equipment cost and good fabrication flexibility. This paper investigates the morphology evolution of the silicon surface etched by an Ar/CF4/O2 plasma and the associated optical properties. Results show that the generation of the light trapping structure on the polished silicon surface can be divided into two stages on the basis of the multi-scale morphological images and the quantitative evaluation of roughness parameters. The initial roughening stage mainly involves the formation of high-frequency nanoroughness that can act as an effective medium layer with a gradual refractive index. The resulting optical medium effect can reduce the surface reflectance within a broad range of wavelengths. At the next texturing stage, the low-frequency and high-amplitude microroughness dominates the morphology of the etched silicon surface. It features inverted parabolic structures with a high aspect ratio, which can cause multiple reflections of the incident light. The optical medium effect resulting from the nanoroughness is also inherited. Thus, the anti-reflectance property of the etched silicon surface is greatly improved. This work demonstrates that the light trapping properties of silicon surface etched by atmospheric plasma jet are a synergy of the optical medium effect and geometrical optics. Insights into the morphology evolution and optical properties of the textured surfaces are important for developing a new surface texturing process of silicon solar cells.

This paper reports on the ohmic contact formed by the conductive glass layer found at the interface of Ag/Si contacts on lowly doped emitter silicon solar cells due to the presence of semimetal nanoparticles. The scanning electron microscopy and scanning transmission electron microscope analyses revealed an interface glass layer (IGL) thickness of greater than 380 nm, which was enriched with micro-sized alloys composed of semimetal nanoparticles. This IGL was conductive as confirmed by conductive atomic force microscopy (C-AFM). The presence of these semimetal nanoparticles, identified as Ag 2Te and PbTe, was both endowed with low bandgap energies as confirmed by Raman spectroscopy and energy dispersive x-ray spectroscopy. These semimetal nanoparticles were found only in the IGL and formed a “bridge” to connect the Ag gridline and Si emitter for carrier transport. Based on the modified Fowler–Nordheim tunneling process, the modeled C-AFM I–V characteristic curve showed a barrier height of 0.1 eV corresponding to an IGL thickness of only 18 nm. Thus, the carrier transport mechanism “through the conductive bridge” was formed by the semimetal nanoparticles embedded in the IGL. Therefore, the high conductivity of the interface glass led to the specific contact resistance to be independent of the emitter peak doping concentration.

The goal of this paper was to investigate the optical properties of the nanofibrous structures synthesized by plasma ionization at a various number of pulses manipulated by laser frequency and scanning speed. Through experimental analyses, it was determined that more nanofibers were generated at higher frequencies and slower scanning speeds. Also, it was found that generated nanofibers have hybrid structures of both silicon and silicon oxide due to being prepared under ambient conditions and rapid cooling process. Slower scanning speeds produced greater amounts of silicon oxide as the average surface temperature is above the oxidation threshold; however, increasing the pulse numbers via the laser frequency has a reverse effect as at higher frequency, the average surface temperature is lower. This was confirmed through both experimental and theoretical results obtained via computerized simulations.

Nonmagnetic semiconductor based magnetoresistance (MR) devices combining high performance and low cost have attracted a lot of attention. However, it has been a great challenge to separate the interface MR from the bulk MR in the devices composed of Schottky heterojunctions. In this paper, the MR effect of a silicon-based Schottky heterojunction device had been studied, and its mechanisms were investigated by separating the interface MR effects from the bulk MR effects through combining two-probe and four-probe methods. We find that the bulk MR value is significantly smaller than the total MR value in the avalanche breakdown region in the temperature range of 150 K to 300 K, indicating that the total MR effect mainly originates from the interface MR effect. Theoretical analysis shows that the bulk MR effect is a normal one due to the existence of the Lorentz force on the carriers, and the interface MR effect relates to the suppression of the local plasmas by applying magnetic fields, where the local plasmas form due to the avalanche breakdown in the Ag/SiO2/p-Si Schottky heterojunctions. The total MR effect at room temperature can be further enhanced by reducing the distance between electrodes, and the total MR reaches about 1847% under a magnetic field of 1 T and the MR sensitivity is as large as 118.5 T−1 under 0.1 T.

In this paper, we report on the results of a detailed study of the properties of a Mo/a‐Si/a‐Si:H/W Schottky barrier produced by rf diode reactive sputtering. This paper is divided into two sections. In the first part, the Mo/a‐Si and W/a‐Si:H interfaces are investigated using a grazing incidence x‐ray diffraction method. The W/a‐Si:H interface seems to be inert, while the Mo/a‐Si one is highly reactive: the Mo3Si compound is identified without ambiguity. The second part deals with the electrical properties of a Mo/a‐Si/a‐Si:H/W Schottky barrier. The experimental I‐V characteristics were analyzed using a numerical method. The most important diode parameters were deduced: the barrier height value was 0.69 eV, the density of states near the Fermi level was 1.2×1017 cm−3 eV−1, and the depletion region thickness was 0.2 μm.

High‐voltage silicon photoconductive switches require pulse bias in order to prevent thermal runaway. The behavior of these devices during pulse bias cannot be modeled by standard steady‐state current equations (Ohm’s law). This paper shows that the observed nonlinear behavior is due to plasma injection, describes an analysis of this transient current flow during pulse bias, and shows it to be in good agreement with our experimental results. This paper further verifies the charge injection by showing that the leakage current can be reduced by thin trap layers directly underneath the metal contacts.

The fabrication of a planar guard ring diode which exhibits uniform microplasma‐free breakdown is described. Discrepancies are discussed between the behavior of these junctions and those reported by Batdorf et al. and Chynoweth, including results showing extremely hard V‐I characteristics associated with uniform avalanche breakdown. Experimental evidence is presented which confirms Shockley's theory in which the breakdown behavior is predicted from the Poisson distribution of impurities within the space‐charge layer. The photomultiplication technique as described in Paper I is applied to uniform p—n junctions. The linearity of 1/M vs V, as predicted by theory, was verified for values of M between 1.6 and 500. For higher values, the multiplication curves deviate from a straight line. In this higher range they are in good agreement with the pulse‐multiplication model developed in Paper I. Light emission patterns from these junctions are shown and a correlation between these patterns and crystal properties is discussed. The effects of resistivity striations in the silicon single crystals is shown to have a strong effect on breakdown areas and no effects of dislocations and oxygen on uniformity are found. From capacity and multiplication measurements a value for the breakdown field of EB=445±25 kV/cm was obtained for a 32‐V junction.

The principal aim of this paper is to develop the theoretical and computational procedures used in the following paper. The Eikonal theory of crystal diffraction is summarized, and the computational procedures for obtaining the ray trajectory and the phase change along the ray in distorted crystals are described. Specifically, the x‐ray diffraction theory is applied to the analysis of dynamical diffraction effects observed by x‐ray topography at the edge of a thin oxide film superposed on a silicon host crystal. The critical importance of symmetry properties of topographs in evaluating the computational procedures is emphasized. The present computational procedures are quite general and can be used with appropriate modifications for a quantitative understanding of diffraction effects, due to any general distortion in crystals observed in topographs of the section type.

In today's manufacturing of organic light-emitting diode on silicon for microdisplay technologies, a top-emitting OLED (TEOLED) is required to be fabricated on top of an active-matrix circuitry located on the silicon backplane. This requires a highly reflective anode to enhance the luminance output. However, during the production process of a TEOLED, the hole injection efficiency and electrical conductivity may be suppressed by environmental exposure, in particular, moisture and oxygen. Given this, aluminum is an unfavorable reflective anode due to the primary concern of its native insulating oxide layer. The native oxide tends to grow during the patterning of the metal anode. In this paper, we have discovered that, by utilizing an Al2O3/MoO3 heterojunction anode structure, a highly efficient device can be made to achieve a current efficiency of 94 cd/A at a luminance of 1000 cd/m2. X-ray/ultraviolet photoelectron spectroscopy measurements show the formation of molybdenum gap states and favorable energy level alignment for hole injection.