1. High temperature in-situ phase stability of sputtered TiAlxN coatings.
- Author
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Patel, Shyam Bharatkumar, Mohammadpour, Ehsan, Mondinos, Nicholas, Zhao, Xiaoli, Veder, Jean-Pierre, Zhou, Zhi-feng, Moh, T.S.Y., Hsien Liew, Willey Yun, Lee, Sunghwan, and Jiang, Zhong-Tao
- Subjects
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NANOINDENTATION , *NANOMECHANICS , *HIGH temperatures , *MATERIAL plasticity , *FIELD emission electron microscopy , *X-ray photoelectron spectroscopy , *THIN films - Abstract
Abstract The temperature dependence of phase composition and lattice parameters, for TiAl x N thin film coating, are experimentally investigated by in-situ synchrotron radiation X-ray diffraction (SR-XRD), at temperatures between 25 °C and 700 °C. Mechanical properties, such as: Young's modulus (E), hardness (H) and plastic deformation index (PDI) – were experimentally determined by nanoindentation, at 25 °C. Crystalline structural analysis, of SR-XRD results, indicates the major phases are TiN and AlN; with Ti 2 O and TiO 2 phases also present above 600 °C. The lattice constants increased with an increase in temperature. Atomic and phase compositions, at 25 °C, were also verified by X-ray photoelectron spectroscopy (XPS). Field emission scanning electron microscopy (FESEM) images display an increase in surface roughness and reduction in grain size, with increasing Aluminium percentage (Al%). Nanoindentation analysis showed a maximum hardness of 25.1 ± 1.5 GPa (sample containing 12% Al), which was subsequently reduced upon addition of more Aluminium. Finite element modelling (FEM), including von Mises stress distribution, indicates lower mechanical integrity, for samples with high Al% content. Highlights • Hardness increase upon the addition of small amounts of Aluminium doping. • Significant increase in resistance of plastic deformation with increasing doping. • High temperature in-situ analysis detected an increase in lattice parameters. • Film coatings with different doping exhibited different oxidation states. • Finite element modelling evaluated mechanical integrity of films under load. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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