18 results on '"Horibe, Hideo"'
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2. Enhanced decomposition of toxic pollutants by underwater pulsed discharge in the presence of hydrogen peroxide and microbubbles.
3. Oxygen additive amount dependence of rate of photoresist removal by H radicals generated on a tungsten hot-wire catalyst
4. Reaction mechanism of polymer removal using wet ozone
5. Parametric Study on the Physical Action of Steam–Water Mixture Jet: Removal of Photoresist Film from Silicon Wafer Surfaces
6. Study of the Removal of Ion-Implanted Resists Using Wet Ozone
7. Substrate Temperature Dependence of the Photoresist Removal Rate Using Atomic Hydrogen Generated by a Hot-Wire Tungsten Catalyst
8. Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface
9. Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water
10. Development of Multilayer Resist Technology for Halftone Mask in Liquid Crystal Display Manufacturing
11. Novolak Resist Removal by Laser Irradiation (532 nm) and Adhesion between Resist and Substrate
12. Electrical Conductivity of Polymer Composites Filled with Metal
13. Characterization of Two-Photon Absorption Related to the Enhanced Bulk Damage Resistance in CsLiB6O10 Crystal
14. Electrical Conductivity of Polymer Composites Filled with Carbon Black
15. Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength
16. Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
17. Relationship between Dissolution Inhibitors and Dissolution Rate of Resist in Chemically Amplified Three-Component Positive Resist
18. Organotin-Containing Resists (TMAR) for X-Ray Lithography
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