1. Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide
- Author
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S. G. Psakh’e, A. I. Lotkov, S. N. Meisner, A. R. Sungatulin, Ludmila L. Meisner, and V. P. Sergeev
- Subjects
Materials science ,Ion beam ,Silicon ,Metallurgy ,Alloy ,technology, industry, and agriculture ,General Engineering ,chemistry.chemical_element ,engineering.material ,equipment and supplies ,Microstructure ,chemistry ,engineering ,Surface modification ,General Materials Science ,Surface layer ,Irradiation ,Composite material ,Electron backscatter diffraction - Abstract
Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.
- Published
- 2013
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