1. Study of temperature-dependent charge conduction in silicon-nanocrystal/SiO2 multilayers
- Author
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Narasimha Rao Mavilla, Juzer Vasi, Vinayak Chavan, and Chetan Singh Solanki
- Subjects
Materials science ,Analytical chemistry ,Generation ,Transport ,Silicon-Nanocrystals ,Solar-Cells ,02 engineering and technology ,Efficiency ,01 natural sciences ,Conduction Mechanism ,Trap-Assisted Tunneling ,Electric field ,0103 physical sciences ,Materials Chemistry ,Thin film ,Quantum tunnelling ,010302 applied physics ,Condensed matter physics ,Tandem ,Metals and Alloys ,Charge (physics) ,Si-Nanocrystals ,Voltage ,Surfaces and Interfaces ,021001 nanoscience & nanotechnology ,Thermal conduction ,Inductively Coupled Plasma Enhanced Cvd ,Space charge ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Light-Emission ,Photovoltaics ,Electroluminescence ,Inductively coupled plasma ,Silicon Nanocrystal ,0210 nano-technology - Abstract
Silicon-nanocrystals (Si-NCs) realized by SiOx8 MV/cm; independent of temperature), while for lower electric fields (5-8 MV/cm) at higher temperatures, the trap-related Generalized Poole-Frenkel (GPF) is dominant. This signified the role of traps in modifying the conduction in bulk ICPCVD SiO2 films. We then present the conduction in ML samples. For multilayer samples with SiO2 sublayer thickness of 1.5 nm and 2.5 nm, Direct Tunneling (DT) is observed to be dominant, while for SiO2 sublayer thickness of 3.5 nm, Space Charge Limited Conduction (SCLC) with exponential trap distribution is found to be the dominant conduction mechanism. This signifies the role of traps in modifying the conduction in Si-NC multilayer samples and SiO2 sublayer thickness dependence. (C) 2016 Elsevier B.V. All rights reserved.
- Published
- 2016
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