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The 1-Mb RAM utilizes a one-transistor, one-capacitor dynamic memory cell. Since all the refresh-related operations are done on chip, the RAM acts as a virtually static RAM (VSRAM). The refresh operations are merged into the normal operation, called a background refresh, the main feature of the VSRAM. Since the fast operation of the core part of the RAM is crucial to minimize the access-time overhead by the background refresh, 16 divided bit lines and parallel processing techniques are utilized. Novel hot-carrier resistant circuits are applied selectively to bootstrapped nodes for high hot-carrier reliability. N-channel memory cells are embedded in a p-well, which gives a low soft error rate of less than 10 FIT. 1-/spl mu/m NMOSFETs with moderately lightly doped drain structures offer fast 5-V operation with sufficient reliability. An advanced double-level poly-Si and double-level Al twin-well CMOS technology is developed for fast circuit speed and high packing density. The memory cell size is 3.5/spl times/8.4 /spl mu/m/SUP 2/, and the chip size is 5.99/spl times/13.8 mm./SUP 2/. Address access time is typically 62 ns, with 21-mA operating current and 30-/spl mu/A standby current at room temperature.

A high-density (512K-word/spl times/8-b) erasable programmable read-only memory (EPROM) has been designed and fabricated by using 0.8-/spl mu/m n-well CMOS technology. A novel chip layout and a sense-amplifier circuit produce a 120-ns access time and a 4-mA operational supply current. The interpoly dielectric, composed of a triple-layer structure, realizes a 10-/spl mu/s/byte fast programming time, in spite of scaling the programming voltage V/SUB PP/ from 12.5 V for a 1-Mb EPROM to 10.5 V for this 4-Mb EPROM. To meet the increasing demand for a one-time programmable (OTP) ROM, a circuit is implemented to monitor the access time after the assembly. A novel redundancy scheme is incorporated to reduce additional tests after the laser fuse programming. Cell size and chip size are 3.1/spl times/2.9 /spl mu/m/SUP 2/ and 5.86/spl times/14.92 mm/SUP 2/, respectively.

The system, circuit, layout and device levels of an integrated cache memory (ICM), which includes 32 kbyte DATA memory with typical address to HIT delay of 18 ns and address to DATA delay of 23 ns, are described. The ICM offers the largest memory size and the fastest speed ever reported in a cache memory. The device integrates a 32 kbyte DATA INSTRUCTION memory, a 34 kbit TAG memory, an 8 kbit VALID flat, a 2 kbit least recently used (LRU) flag, comparators, and CPU interface logic circuits on a chip. The inclusion of the DATA memory is crucial in improving system cycle time. The device uses several novel circuit design technologies, including a double-word-line scheme, low-noise flush clear, a low-power comparator, noise immunity, and directly testable memory design. Its newly proposed way-slice architecture increases both flexibility and expandability. >

Field isolation technology is described for small geometry VLSI's in which selective polysilicon oxidation is essential. The technology, also known as SEPOX, offers resist pattern reproducibility in field oxide, while maintaining crystal perfection in the substrate. By a series of experiments, high oxide reliability resulting from a white ribbon-free nature, long lifetime from C-T measurement, and small leakage currents in a reverse biased p-n junction were obtained, as well as a small geometry structure. The feasibility of this technology for MOS LSI's were examined in a 3-/spl mu/m rule memory chip, and a reasonable yield and reliability were obtained. The physical limitations of SEPOX were also considered and submicrometer capability was confirmed.

A 1-Mb (128K*8) pseudostatic RAM (PSRAM) is described. A novel feature of the RAM is the inclusion of a virtually static RAM (VSRAM) mode, while being fully compatible with a standard PSRAM. The RAM changes into the VSRAM mode when the RFSH pin is grounded, even in active cycles. The RAM can be used either as a fast PSRAM of 36-ns access time or as a convenient VSRAM of 66-ns access time. The typical operation current and data-retention current are 30 mA at 160-ns cycle time and 30 mu A, respectively. In order to achieve high-speed operation, low data-retention current, and high reliability, the RAM uses delay-time tunable design, a current-mirror timer, hot-carrier resistant circuits, and an optimized arbiter. These technologies are applicable to general advanced VLSIs. >

The design and performance of a high-speed 1 M*1-bit SRAM with ECL I/O are described. The 6.5*16.5-mm/sup 2/ chip was fabricated with a 0.8- mu m BiCMOS process technology. A modified double-word-line (MDWL) structure and a bit-line peripheral circuitry with normally-on bit-line equalization circuit are used to achieve high-speed read operation. The read speed is further enhanced by a novel ECL-to-CMOS-level converter with a double-latch configuration. The converter dissipates no DC current and contributes to low power consumption together with an automatic power-saving function, utilizing the address transition detection (ATD) technique. The access time is typically 8 ns, and the active power is 500 mW at 50 MHz. >