The present paper deals with something about the influence of adsorbed impurity centres on the electrical properties of germanium and silicon. After a historical review and an introduction to the fundamental conceptions (§ 2), the essential properties of semiconductor surfaces are discussed. § 3 deals with surface recombination and after an illustration of the term of surface recombination velocity summarizes measuring methods and experimental results; furtheron, the influence on the electrical behaviour of rectifiers and transistors is discussed, and finally, the effective surface recombination is dealt with. § 4 contains a review of measuring methods and experimental results on work function and contact potential. § 5 describes the surface conduction, particularly the channels. § 6 reviews the surface model of Brattain and Bardeen, commonly used for the explanation of surface properties. In the following chapters, the physical properties of surfaces are, under simplified conditions, treated quantitatively, and, as far as possible, illustrated by experimental examples. In § 7, the occupation of surface terms under thermal equilibrium as a function of density and energy level is derived, and work function and surface conductivity, including field effect, are discussed. § 8 deals with surface recombination, i. e. with electron transitions between surface levels and energy bands. § 9 describes the theory of work function under the influence of ligth as developed by Brattain and Bardeen. Finally, § 10 deals with the special properties of channels, namely, with Schrieffer's theory of carrier mobility in channels, on one side, and the channel conductivity parallel to the surface, on the other. § 11 discusses the influence of channels on the dc and ac behaviour of rectifiers and transistors as far this is possible today. [ABSTRACT FROM AUTHOR]