1. Advanced X-Ray Alignment System
- Author
-
B. S. Fay and W. T. Novak
- Subjects
Engineering ,Optical alignment ,biology ,business.industry ,Electrical engineering ,Integrated circuit ,biology.organism_classification ,Computational science ,law.invention ,Very large scale integrated circuits ,Micronix ,law ,Distortion ,X-ray lithography ,Photomask ,business ,Lithography - Abstract
Step and repeat X-ray lithography is essential for achieving the fine lines, accurate registration, and extreme density required to produce the next generation of very large scale integrated circuits. Drawing upon its own experience in developing a full-field X-ray lithography system [1], as well as upon technology developed at companies such as Thomson-CSF [2] and AT&T [3], Micronix Corporation in Los Gatos, California, is introducing such a system, called the MX-1600.
- Published
- 1986