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Your search keyword '"Čeppan, Michal"' showing total 5 results
Start Over Author "Čeppan, Michal" Journal czechoslovak journal of physics
5 results on '"Čeppan, Michal"'

4. Photoelectrochemical properties of TiO x layers prepared by DC pulsed unbalanced reactive magnetron sputtering.

Author

Mikula, Milan, Čeppan, Michal, Kindernay, Juraj, and Búc, Dalibor

Abstract

Three sets of titanium oxide layers with different oxygen content were prepared by DC pulsed reactive magnetron sputtering. The layers were characterised by their thickness, conductivity, refractive index, band-gap and flat band potential. The photoelectric and photocatalytic activities of the layers irradiated by Xe discharge lamp were tested in NaOH and phenol water solution, respectively. Rather high activity of prepared layers was found; no expressive activity increase was, however, observed in contrary to the expectation connected with suboxide forms of TiO x. [ABSTRACT FROM AUTHOR]

Published
1999
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5. Effect of Ti pretreatment on photoelectric properties of TiO2 layers prepared by plasma-anodic oxidation

Author

Mikula, Milan, Blecha, Jozef, Čeppan, Michal, and Panák, Ján

Abstract

Photoactive TiO2 layers were formed by anodic oxidation of Ti in O2 RF plasma under various conditions and Ti surface pretreatment. The photocurrent spectrum in 1M NaOH was used to calculate the quantum efficiency of the photocurrent production and the band-gap energy for indirect transitions. Photoelectrochemical properties of TiO2 layers were studied on the decomposition of p-cresol water solution. The method of Ti surface pretreatment (mechanical polishing or chemical etching) has a decisive influence on the photoelectrochemical properties and the structure of the polycrystalline oxide, rutile, anatase or amorphous phase content.

Published
1995
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