1. Channeling Alignment for Epitaxial Light-Mass Film on Heavy-Mass Substrate
- Author
-
Shiduan Yin, Peiran Zhu, and Guangming Xiao
- Subjects
Condensed Matter::Materials Science ,Materials science ,Impurity ,business.industry ,Condensed Matter::Superconductivity ,General Physics and Astronomy ,Optoelectronics ,Cubic zirconia ,Substrate (electronics) ,Single crystal substrate ,Epitaxy ,business - Abstract
A simple procedure for obtaining a background-free backscattering spectrum of a light-mass film on a heavy-mass substrate by a normal incidence/grazing exit geometry has been described. Using this method such films can be aligned rapidly and accurately, and the impurity or defect information on the films can be obtained without need for realignment. Example is given from MeV Li-3+ analysis of a deposited film of Si on a single crystal substrate of yttria-stabilized, cubic zirconia.
- Published
- 1994