1. Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100).
- Author
-
Mehr, Mahtab Salari, Aarik, Lauri, Jõgiaas, Taivo, Kasikov, Aarne, Kozlova, Jekaterina, Vidal, Loïc, Mougin, Karine, and Mändar, Hugo
- Subjects
- *
ATOMIC layer deposition , *ALUMINUM oxide , *CHROMIUM oxide , *WEAR resistance , *OXIDE coating - Abstract
This study presents the comparison of microstructure, mechanical, tribological, and optical properties of the ternary chromium-aluminum oxide films ((Cr 1-x Al x) 2 O 3) with binary Cr 2 O 3 and Al 2 O 3 films, deposited by atomic layer deposition at 275 °C. The atomic growth per cycle of the Al atoms increased from 3.1 to 8.5 atoms/nm2 on chromium oxide film. The Al 2 O 3 films were X-ray amorphous. The Cr 2 O 3 films contained crystallites of the eskolaite phase. Nano-size (diameter from 3 to 5 nm) crystallites with cubic symmetry and matching with that of cubic γ-Al 2 O 3 or η-Al 2 O 3 phases were observed in (Cr 1-x Al x) 2 O 3 films. The ternary film with Al/(Al + Cr) of 0.40 showed the highest hardness (18.4 GPa) and elastic modulus (169.4 GPa), whereas the wear rate of this film decreased by ∼80 % compared with Cr 2 O 3 films. Optical band gap energy values corresponding to the indirect transition model decreased from 2.93 eV for the Cr 2 O 3 film to 2.58 eV for the Cr-Al-O films. [Display omitted] • The process of atomic layer deposition of (Cr 1-x Al x) 2 O 3 films was studied. • Nanocrystallites with size of 3–5 were observed in (Cr 1-x Al x) 2 O 3 films. • The increase in hardness and elastic modulus for (Cr 1-x Al x) 2 O 3 films was observed. • The wear resistance of the ternary films improved by about 80 % compared with Cr 2 O 3. • Changes in optical properties of the Cr 2 O 3 films were detected by doping with Al. [ABSTRACT FROM AUTHOR]
- Published
- 2024
- Full Text
- View/download PDF