1. Optical properties of plasma-polymerized organosilicone films
- Author
-
Jolanta-Ewa Klemberg-Sapieha, R. Corriveau, and Michael R. Wertheimer
- Subjects
Physics ,Hexamethyldisiloxane ,Infrared ,business.industry ,Analytical chemistry ,General Physics and Astronomy ,Silazane ,Substrate (electronics) ,chemistry.chemical_compound ,Monomer ,Optics ,chemistry ,Ellipsometry ,Thin film ,business ,Refractive index - Abstract
The refractive index, n, of plasma-polymerized hexamethyldisiloxane and -silazane thin films has been measured by ellipsometry at 632.8 nm. For both types of films n was found to increase from about 1.4 to about 1.7, with increasing substrate temperature during film deposition, Ts. Using the Lorentz–Lorenz equation and our previously published density and infrared data for these thin film materials, it is shown that films produced at [Formula: see text] are essentially "inorganic." Calculated n values for hypothetical structures (Si2O)x and (Si2N)x (expected from the "monomer" compositions) agree to within a few percent with measured data.
- Published
- 1982