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[Display omitted] • Nanoscale roughness was fabricated by using lithography to study the particle adhesion. • Fabricated rough surface was characterized by AFM, FE-SEM, and EDX. • Contact area between the AFM probes and surfaces depends on the type of probes and fraction of roughness on surfaces. • Increasing the contact area reduced the adhesion force and improved the repulsive force. Despite substantial theoretical approaches explaining the effect of nanoscale roughness (NR) on particle deposition, experiments are rarely performed. Fabricating the sophisticated rough surfaces and obtaining the experimental data for interaction between the colloids and surfaces are crucial to understand colloidal adsorption onto the rough surfaces. We investigated the adhesion of different particle types of atomic force microscope (AFM) probes (different shapes, i.e., sphere and plateau; diameters, i.e., 2 μm–15 μm) onto smooth and rough fabricated surfaces. We successfully fabricated well-organized rough surfaces on Silicon (Si) using colloidal lithography and metal-assisted chemical etching using a cylindrical shape of constant nanoscale height and diameter. The properties of roughness (i.e., height, diameter, and fraction) were quantitatively analyzed, and the corresponding. The force-distance curves measured with the AFM revealed that, for the four types of probes, contact area varied with the surface roughness, and their adhesion forces differed accordingly. Expanding the contact area tended to increase the repulsive force possibly because of the hydration force. This study effectively devised a simplified experimental system that explains the influence of NR on particle deposition using previous theoretical data. The findings should be considered in designing NR for subsequent colloidal deposition. [ABSTRACT FROM AUTHOR]

Hydrocarbon polymer films (ppCH) enriched with various concentrations of titanium were deposited on microscopic glass slides by magnetron sputtering from a Ti target. The maximum concentration of Ti (about 20 at.%) was achieved in a pure argon atmosphere. The concentration of Ti decreased rapidly after n -hexane vapors were introduced into the plasma discharge, and reached zero values at n -hexane flow of 0.66 sccm. The decrease in Ti concentration was associated with decreasing oxygen and titanium carbide concentration in the films, decreasing wettability (the water drop contact angle increased from 20° to 91°) and decreasing root-mean-square roughness (from 3.3 nm to 1.0 nm). The human osteoblast-like MG-63 cells cultured on pure ppCH films and on films with 20 at.% of Ti showed relatively high concentrations of ICAM-1, a marker of cell immune activation. Lower concentrations of Ti (mainly 5 at.%) improved cell adhesion and osteogenic differentiation, as revealed by higher concentrations of talin, vinculin and osteocalcin. Higher Ti concentrations (15 at.%) supported cell growth, as indicated by the highest final cell population densities on day 7 after seeding. Thus, enrichment of ppCH films with appropriate concentrations of Ti makes these films more suitable for potential coatings of bone implants. [ABSTRACT FROM AUTHOR]